Methods and Systems for Stabilizing Filaments in a Chemical Vapor Deposition Reactor

A method of stabilizing filaments in a chemical vapor deposition reactor, the method comprising the steps of:

• providing a pair of filaments extending from a base plate in the chemical vapor deposition reactor, the base plate comprising a plurality of electrical connections, each filament (i) being in electrical contact with two of the electrical connections and (ii) defining a conductive path between the two electrical connections;
• and connecting the pair of filaments with at least one stabilizer.

A method of performing chemical vapor deposition in a chemical vapor deposition reactor, the method comprising:

• passing electrical current through a pair of filaments in the chemical vapor deposition reactor, the filaments extending from a base plate in the reactor, the base plate comprising a plurality of electrical connections, each filament (i) being in electrical contact with two of the electrical connections, (ii) defining a conductive path between the two electrical connections, and (iii) being connected with a stabilizer;
• and depositing polysilicon on the pair of filaments.