Polishing Method and Polishing Composition
AssigneeFujimi Incorporated
InventorsShuhei TAKAHASHI, Masatoshi TOMATSU
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Abstract
Provided is a method for polishing a material having a Vickers hardness of 1500 Hv or higher. The polishing method comprises a step of carrying out preliminary polishing using a preliminary polishing composition that comprises an abrasive APRE and a step of carrying out final polishing using a final polishing composition that comprises an abrasive AFIN lower in hardness than the abrasive APRE.
Claims20
A method for polishing a material having a Vickers hardness of 1500 Hv or higher, the method comprising
- a step of carrying out preliminary polishing using a preliminary polishing composition that comprises an abrasive APRE, and
- a step of carrying out final polishing using a final polishing composition that comprises an abrasive AFIN lower in hardness than the abrasive APRE.
A method for polishing a material having a Vickers hardness of 1500 Hv or higher, the method comprising
- a step of carrying out preliminary polishing using a preliminary polishing composition, and
- a step of carrying out final polishing using a final polishing composition, wherein
- the preliminary polishing composition has an oxidation-reduction potential ORPPRE vs. standard hydrogen electrode, and the final polishing composition has an oxidation-reduction potential ORPFIN vs. standard hydrogen electrode, satisfying a relation ORPPRE>ORPFIN.
A method for polishing a material having a Vickers hardness of 1500 Hv or higher, the method comprising
- a step of carrying out preliminary polishing using a preliminary polishing composition that comprises an abrasive APRE, and
- a step of carrying out final polishing using a final polishing composition that comprises an abrasive AFIN, wherein
- the preliminary polishing composition has a standard polishing removal rate RPRE on a SiC wafer, and the final polishing composition has a standard polishing removal rate RFIN on the SiC wafer, satisfying a relation RPRE>RFIN.
Dependencies are inferred from the claim text.