Method of stem-based drilling of ultrathin silicon nitride nanopores and nanopore arrays
AssigneeThe Trustees of the University of Pennsylvania
InventorsMarija DRNDIC, Julio A. RODRIGUEZ-MANZO
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Abstract
The invention concerns methods for preparing a nanoporous silicon nitride membrane comprising (i) ablating portions of at least one side of the membrane with an electron beam to reduce the thickness of the portions to between about 0.5 and 5 nanometers, and (ii) penetrating subportions of the ablated portions of the membrane with an electron beam to form nanopores having internal surfaces which are predominantly silicon rich compared to unablated portions of the membrane.
Claims15
A method for preparing a nanoporous silicon nitride membrane comprising ablating portions of at least one side of the membrane with an electron beam to reduce the thickness of the portions to between about 0.5 and 5 nanometers;
- penetrating subportions of the ablated portions of the membrane with an electron beam to form nanopores having internal surfaces which are predominantly silicon rich compared to unablated portions of the membrane.
Dependencies are inferred from the claim text.