Electrophoretic deposition fluid, metal core substrate, and method for fabricating the metal core substrate
AssigneeMie University
InventorsYusuke AOKI, Mikihito KANO, Kazuhiko KASANO
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Abstract
The invention is directed to a metal core substrate having high thermal conductivity and high electrical insulating properties; an electrophoretic deposition fluid for use in fabrication of the metal core substrate; and a method for fabricating the metal core substrate. The electrophoretic deposition fluid is used during electrophoretic deposition, and contains ceramic particles for coating a metal substrate, and an organopolysiloxane composition which binds the ceramic particles.
Claims13
1-13. (canceled)
An electrophoretic deposition fluid for use in electrophoretic deposition, the electrophoretic deposition fluid comprising
- ceramic particles for coating a metal substrate and an organopolysiloxane composition which binds the ceramic particles, the organopolysiloxane composition containing at least one of:
- polydialkylsiloxane;
- polydiarylsiloxane;
- polyalkylarylsiloxane;
- polydialkylsiloxane terminally modified with metal alkoxide;
- polydiarylsiloxane terminally modified with metal alkoxide;
- and polyalkylarylsiloxane terminally modified with metal alkoxide.
A metal core substrate comprising:
- a metal substrate;
- and
- an electrical insulating layer on the metal substrate, wherein
- the electrical insulating layer contains ceramic particles and a binder which binds the ceramic particles, the binder containing, as a raw material, an organopolysiloxane composition containing at least one of:
- polydialkylsiloxane;
- polydiarylsiloxane;
- polyalkylarylsiloxane;
- polydialkylsiloxane terminally modified with metal alkoxide;
- polydiarylsiloxane terminally modified with metal alkoxide;
- and polyalkylarylsiloxane terminally modified with metal alkoxide, and
- the metal core substrate has thermal conductivity of 2 W/mK or greater and an electrical breakdown strength of 50 kV/mm or greater, and heat-resistant temperature of the metal core substrate is 200 degrees Celsius or greater.
A method for fabricating a metal core substrate, the method comprising:
- forming an electrophoretic deposition fluid containing ceramic particles and an organopolysiloxane composition which binds the ceramic particles;
- and
- selectively forming an electrical insulating layer on a surface of a metal substrate by electrophoretic deposition using the electrophoretic deposition fluid, the electrical insulating layer comprising the ceramic particles.
A method for fabricating a metal core substrate, the method comprising:
- carrying out plasma electrolytic oxidation on a surface of a metal substrate;
- and
- sealing micropores in the surface of the metal substrate subjected to the plasma electrolytic oxidation, by electrophoretic deposition using an electrophoretic deposition fluid containing ceramic particles and an organopolysiloxane composition which binds the ceramic particles.
Dependencies are inferred from the claim text.