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US 2017/0292022 A1Published application
Sulfone polymer composition
AssigneeSolvay Specialty Polymers USA, LLC
InventorCorinne BUSHELMAN
Life of this patent
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Abstract
The invention pertains to a polymer composition possessing improved resistance towards degradation and discolouring phenomena induced by UV radiation, said composition comprising at least one aromatic sulfone polymer; at least one organic UV absorber and at least one basic compound selected from the group consisting of (i) basic oxides and hydroxides of divalent metals and (ii) salts of a weak acid, and to methods for its manufacture and to shaped articles obtained therefrom.
Claims22
1-15:
- (canceled)
A composition comprising:
- at least one aromatic sulfone polymer (P);
- at least one organic UV absorber selected from the group consisting of hydroxylphenyl-triazine compounds (T), cyanoacrylate compounds (CN), benzoxazin-4-one compounds (BX), and benzotriazole compounds (BT);
- and
- at least one basic compound (B) selected from the group consisting of (i) basic oxides and hydroxides of divalent metals and (ii) salts of a weak acid.
1 more element
Dependencies are inferred from the claim text.