Surfactant-containing amide compound solution
AssigneeMitsubishi Rayon Co., Ltd.
InventorsMakoto KANO, Norifumi HAGIYA
Life of this patent
Estimating the term…
Abstract
The present invention relates to an amide compound solution comprising an amide compound and a surfactant. More specifically, the invention relates to an amide compound solution comprising amide compound, and 2.7˜20 mg of a cationic surfactant per 1 kg of the amide compound or 0.01˜10 mg of a C15˜C20 carboxylic acid or its salt as an anionic surfactant per 1 kg of the amide compound. The present invention provides an amide compound solution which is manufactured using a biocatalyst and which has a low level of foaming, and thereby improving the operability and yield when manufacturing an amide compound-based polymer.
Claims17
An amide compound solution, comprising:
- an amide compound;
- and
- 2.7˜20 mg of a cationic surfactant per 1 kg of the amide compound, or
- 0.01˜10 mg of a C15˜C20 carboxylic acid or its salt as an anionic surfactant per 1 kg of the amide compound.
An amide compound solution, comprising:
- an amide compound;
- and
- 15˜150 mg of a cationic surfactant per 1 gram of protein in the amide compound solution.
An amide compound solution, comprising:
- an amide compound;
- and
- 0.02˜100 mg of an anionic surfactant per 1 gram of protein in the amide compound solution.
Dependencies are inferred from the claim text.