Stereolithographic apparatus and stereolithographic method

A stereolithography method comprising:

• emitting a first light to a photocurable material;
• emitting a second light to the photocurable material such that a target area is formed in the photocurable material, the target area linearly intersecting the first light in a first direction;
• setting a first area and a second area for at least one of the first light and the second light in the first direction at the target area, the first area and the second area having different optical properties from each other;
• and
• moving the target area, and
• curing the photocurable material at the target area.

A stereolithography apparatus comprising:

• a first optical system that emits a pattern light into a photocurable material, the pattern light including a first area and a second area at least in a first direction, the first area and the second area having different optical properties;
• a second optical system that emits a second light into the photocurable material such that the second area intersects the pattern light;
• and
• a moving mechanism that moves an intersection between the pattern light and the second light in a direction intersecting the first direction, wherein
• the stereolithography apparatus sets a target position and a non-target position in the first direction inside the photocurable material, the target position being a position at which the second light intersects one of the first area and the second area, the non-target position being a position at which the second light does not intersect the one of the first area and the second area.