Non-porous molded article for polishing layer, polishing pad, and polishing method
AssigneeKurray Co., Ltd.
InventorsKiyofumi KADOWAKI, Shinya KATO, Chihiro OKAMOTO, Mitsuru KATO, Minori TAKEGOSHI
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Abstract
Disclosed is a non-porous molded article for a polishing layer, the non-porous molded article including a thermoplastic polyurethane, wherein the thermoplastic polyurethane has a maximum value of a loss tangent (tan 5) in a range of −70 to −50° C. of 4.00×10−2 or less. Preferably, the thermoplastic polyurethane is obtained by polymerization of a polymer diol having a number average molecular weight of 650 to 1400, an organic diisocyanate, and a chain extender, and a content ratio of nitrogen derived from an isocyanate group of the organic diisocyanate is 5.7 to 6.5 mass %.
Claims11
A non-porous molded article for a polishing layer, the non-porous molded article comprising a thermoplastic polyurethane, wherein the thermoplastic polyurethane has a maximum value of a loss tangent (tan δ) in a range of −70 to −50° C. of 4.00×10−2 or less.
A non-porous molded article comprising a thermoplastic polyurethane, wherein the thermoplastic polyurethane has a maximum value of a loss tangent (tan δ) in a range of −70 to −50° C. of 4.00×10−2 or less.
Dependencies are inferred from the claim text.