# US 2017/0288170 A1 · Laminated film and process for manufacturing the same

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- Number: US 2017/0288170 A1
- Document ID: US20170288170A1
- Status: Published application
- Kind: A1
- Application number: 15/471,734
- Filed: 2017-03-28
- Published: 2017-10-05
- Earliest claimed: 2016-03-31
- Assignees: Sumitomo Chemical Company, Limited
- Applicants: Sumitomo Chemical Company, Limited
- Inventors: Yutaka ITO
- Web page: https://patentgrep.com/patent/US20170288170A1

## CPC

- C23C 16/0245: {by etching with a plasma}
- B05D 1/005: {Spin coating}
- B05D 3/067: {Curing or cross-linking the coating}
- C23C 16/308: {Oxynitrides}
- C23C 16/36: Carbonitrides
- C23C 16/401: {containing silicon}
- C23C 16/509: using internal electrodes
- C23C 16/545: {for coating elongated substrates}
- C23C 16/56: After-treatment
- H10K 59/873: {Encapsulations}
- H10K 71/00: Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K 77/111: {Flexible substrates}
- H10K 2101/80: {Composition varying spatially, e.g. having a spatial gradient}
- H10K 2102/311: {Flexible OLED}
- Y02E 10/549: Organic PV cells
- Y02P 70/50: Manufacturing or production processes characterised by the final manufactured product
- Y10T 428/12493: Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T 428/2495: Thickness [relative or absolute]
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02)
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES
- Y02E: REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02P: CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

An object of the present invention is to provide a laminated film which can prevent transmission of the water vapor at the high level, and has good flex resistance, and the present invention provides a laminated film comprising at least a gas barrier layer and an inorganic polymer layer being laminated on a resin substrate, wherein concerning a distance from a surface of the inorganic polymer layer in a film thickness direction of the layer and the ratio of an oxygen atom to a total amount of a silicon atom, an oxygen atom, a carbon atom and a nitrogen atom (oxygen atomic ratio), the ratio of a value of the oxygen atomic ratio O/(total amount of Si, O, C and N) in a region from a surface on a side opposite to the gas barrier layer up to 30% of a film thickness of the inorganic polymer in a depth direction to a value of the oxygen atomic ratio O/(total amount of Si, O, C and N) in a region from 30% of a film thickness of the inorganic polymer layer in a depth direction up to a surface on a side of the gas barrier layer is 1.05 or more.

## Claims

### Claim 1

A laminated film comprising at least a gas barrier layer and an inorganic polymer layer being laminated on a resin substrate,
wherein concerning a distance from a surface of the inorganic polymer layer in a film thickness direction of the layer and the ratio of an oxygen atom to a total amount of a silicon atom, an oxygen atom, a carbon atom and a nitrogen atom, the ratio of a value of the oxygen atomic ratio in a region from a surface on a side opposite to the gas barrier layer up to 30% of a film thickness of the inorganic polymer layer in a depth direction to a value of the oxygen atomic ratio in a region from 30% of a film thickness of the inorganic polymer layer in a depth direction up to a surface on a side of the gas barrier layer is 1.05 or more.

### Claim 2 (depends on 1)

The laminated film according to claim 1, wherein the ratio of a value of the oxygen atomic ratio in a region from a surface on a side opposite to the gas barrier layer of the inorganic polymer ratio up to 30% of a film thickness of the inorganic polymer layer in a depth direction to a value of the oxygen atomic ratio in a region from 30% of a film thickness of the inorganic polymer layer in a depth direction up to a surface on a side of the gas barrier layer is 2 or less.

### Claim 3 (depends on 1)

The laminated film according to claim 1, wherein the ratio of a value of the oxygen atomic ratio in a region from a surface on a side opposite to the gas barrier layer of the inorganic polymer layer up to 30% of a film thickness of the inorganic polymer layer in a depth direction to a value of the oxygen atomic ratio in a region from 30% of a film thickness of the inorganic polymer layer in a depth direction up to a surface on a side of the gas barrier layer is 1.20 or more.

### Claim 4 (depends on 1)

The laminated film according to claim 1, wherein the gas barrier layer is a silicon oxide-based layer which contains a silicon atom, an oxygen atom and a carbon atom, and
satisfies all of the conditions (i) to (iii), in a silicon distribution curve, an oxygen distribution curve and a carbon distribution curve, each showing a relationship between a distance from a surface of the gas barrier layer in a film thickness direction of the gas barrier layer, and the atomic ratio of silicon, the atomic ratio of oxygen or the atomic ratio of carbon, to a total amount of a silicon atom, an oxygen atom and a carbon atom.
(i) The atomic ratio of silicon, the atomic ratio of oxygen and the atomic ratio of carbon satisfy the condition represented by the expression (1) in a region of 90% or more of a film thickness of the gas barrier layer.
(Atomic ratio of oxygen)>(atomic ratio of silicon)>(atomic ratio of carbon) (1)
(ii) The carbon distribution curve has at least one extreme value.
(iii) An absolute value of a difference between a maximum value and a minimum value of the atomic ratio of carbon in the carbon distribution curve is 5 at % or more.

### Claim 5 (depends on 1)

The laminated film according to claim 1, wherein the gas barrier layer contains a silicon atom, an oxygen atom and a nitrogen atom, and
the gas barrier layer is a silicon oxide-based layer satisfying all of the conditions (iv) and (v).
(iv) The gas barrier layer has a second thin film layer, a first thin film layer, and a third thin film layer which have different oxygen content ratios, from a region substrate side, and an average composition of a silicon atom, an oxygen atom and a nitrogen atom of the first thin film layer is in the range of 10 at %≦Si≦40 at %, 5 at %≦O≦30 at %, 50 at %≦N≦80 at %.
(v) The elemental ratio of a nitrogen atom and a silicon atom of the second and third thin film layers is in the range of the expression (2).
N/Si≦0.2 (2)

### Claim 6 (depends on 1)

The laminated film according to claim 1, wherein the inorganic polymer layer is a layer consisting of a curing product of a composition comprising polysilazane.

### Claim 7

A process for manufacturing a laminated film comprising at least a gas barrier layer and an inorganic polymer layer being laminated on a resin substrate, comprising:
a step of forming the gas barrier layer by chemical vapor deposition,
wherein concerning a distance from a surface of the inorganic polymer layer in a film thickness direction of the layer and the ratio of an oxygen atom to a total amount of a silicon atom, an oxygen atom, a carbon atom and a nitrogen atom, the ratio of a value of the oxygen atomic ratio in a region from a surface on a side opposite to the gas barrier layer up to 30% of a film thickness of the inorganic polymer layer in a depth direction to a value of the oxygen atomic ratio in a region from 30% of a film thickness of the inorganic polymer layer in a depth direction up to a surface on a side of the gas barrier layer is 1.05 or more.

### Claim 8 (depends on 7)

The process for manufacturing a laminated film according to claim 7, comprising a step of forming the inorganic polymer layer by curing a composition comprising an inorganic polymer by irradiation of vacuum ultraviolet light having the wavelength of 200 nm or less.