# US 2017/0285489 A1 · Lithographic apparatus and device manufacturing method

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- Number: US 2017/0285489 A1
- Document ID: US20170285489A1
- Status: Published application
- Kind: A1
- Application number: 15/627,054
- Filed: 2017-06-19
- Published: 2017-10-05
- Earliest claimed: 2007-09-25
- Assignees: ASML Netherlands B.V.
- Applicants: Asml Netherlands B.V.
- Inventors: Marcus Adrianus VAN DE KERKHOF; Siebe LANDHEER; Marcel BECKERS; Jeroen Peter Johannes BRUIJSTENS; Ivo Adam Johannes THOMAS; Franciscus Johannes Joseph JANSSEN
- Web page: https://patentgrep.com/patent/US20170285489A1

## CPC

- G03F 7/70341: {Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041)}
- G03B 27/52: Details
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- G03B: APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR (optical parts of such apparatus G02B; photosensitive materials or processes for photographic purposes G03C; apparatus for processing exposed photographic materials G03D)

## Abstract

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

## Claims

### Claim at position 1

-20. (canceled)

### Claim 21

A lithographic apparatus comprising:
a projection system configured to project a patterned radiation beam onto a target portion of a substrate, the projection system having a final element;
a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid, the barrier member being spaced from the final element to define a gap therebetween;
a deformable protrusion extending into the gap between an outer surface of the final element and an outer surface of the barrier member; and
a liquidphobic surface on the barrier member and/or the final element along at least part of a path, in the gap, between the protrusion and the reservoir.

### Claim 22 (depends on 21)

The lithographic apparatus of claim 21, wherein the deformable protrusion comprises a resilient and/or flexible material.

### Claim 23 (depends on 21)

The lithographic apparatus of claim 21, wherein the deformable protrusion is substantially annular-shaped.

### Claim 24 (depends on 21)

The lithographic apparatus of claim 21, wherein the deformable protrusion comprises a flexible material configured to be, in use, in contact with the liquid.

### Claim 25 (depends on 21)

The lithographic apparatus of claim 21, further comprising a recess constructed and arranged to receive at least a portion of the deformable protrusion.

### Claim 26 (depends on 21)

The lithographic apparatus of claim 21, wherein the deformable protrusion is not in contact with the final element during normal operation of the apparatus.

### Claim 27 (depends on 21)

The lithographic apparatus of claim 21, wherein the deformable protrusion comprises a compressible member configured to be compressed relative to the barrier member and the final element upon relative movement between the barrier member and the final element.

### Claim 28 (depends on 21)

The lithographic apparatus of claim 21, wherein the deformable protrusion is located between a substantially horizontal surface of the barrier member and a substantially horizontal surface of the final element.

### Claim 29 (depends on 21)

The lithographic apparatus of claim 21, wherein the deformable protrusion is spaced from the liquid and wherein a gas having a high partial pressure of inert gas and a low partial pressure of oxygen is located between the deformable protrusion and the liquid.

### Claim 30 (depends on 21)

The lithographic apparatus of claim 21, wherein the outer surface of the barrier member and the outer surface of the final element comprise an essentially liquidphobic surface that respectively face each other.

### Claim 31 (depends on 21)

The lithographic apparatus of claim 21, wherein, in use, the liquid in the reservoir reaches to at or above the level of a substantially horizontal outer surface of the barrier member and/or of the final element.

### Claim 32

A device manufacturing method comprising:
projecting a patterned beam of radiation from a projection system through an immersion liquid onto a target portion of a substrate;
confining the immersion liquid in a space between the projection system and the substrate using a final element of the projection system and a barrier member surrounding the space; and
limiting movement of fluid using a deformable protrusion extending into a gap between an outer surface of the final element and an outer surface of the barrier member, wherein there is a liquidphobic surface on the barrier member and/or the final element along at least part of, a path, in the gap, between the protrusion and the space containing the liquid.

### Claim 33 (depends on 32)

The method of claim 32, wherein the outer surface of the barrier member and the outer surface of the final element each comprise an essentially horizontal liquidphobic surface that respectively face each other.

### Claim 34

A lithographic apparatus comprising:
a projection system configured to project a patterned radiation beam onto a target portion of a substrate, the projection system having a final element;
a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid, the barrier member being spaced from the final element to define a gap therebetween;
a protrusion extending into the gap between an outer surface of the final element and an outer surface of the barrier member;
a liquidphobic surface on the barrier member and/or the final element along at least part of a path, in the gap, between the protrusion and the reservoir; and
a liquidphobic surface on the barrier member and/or the final element along at least part of a path, in the gap, outward from the protrusion relative to the reservoir.

### Claim 35 (depends on 34)

The lithographic apparatus of claim 34, wherein the protrusion has a first end on either the barrier member or the final element and has a second end, in a use, spaced apart by a gap from the other of barrier member or the final element.

### Claim 36 (depends on 34)

The lithographic apparatus of claim 34, wherein the protrusion comprises a flexible material configured to be, in use, in contact with the liquid.

### Claim 37 (depends on 34)

The lithographic apparatus of claim 34, wherein the outer surface of the barrier member and/or of the final element comprises a substantially horizontal outer surface that comprises at least part of the liquidphobic surface.

### Claim 38 (depends on 34)

The lithographic apparatus of claim 34, further comprising a recess constructed and arranged to receive at least a portion of the protrusion.

### Claim 39 (depends on 34)

The lithographic apparatus of claim 34, wherein the protrusion is located between a substantially horizontal surface of the barrier member and a substantially horizontal surface of the final element.

### Claim 40 (depends on 34)

The lithographic apparatus of claim 34, wherein the protrusion is substantially annular-shaped.