# US 2017/0285461 A1 · Pellicle film, pellicle frame, pellicle, and method for producing same

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- Number: US 2017/0285461 A1
- Document ID: US20170285461A1
- Status: Published application
- Kind: A1
- Application number: 15/629,085
- Filed: 2017-06-21
- Published: 2017-10-05
- Earliest claimed: 2015-02-24
- Assignees: Mitsui Chemicals, Inc.
- Applicants: Mitsui Chemicals, Inc.
- Inventors: Atsushi OKUBO; Tsuneaki BIYAJIMA; Yosuke ONO; Kazuo KOHMURA; Yasuhisa FUJII; Nobuko MATSUMOTO
- Web page: https://patentgrep.com/patent/US20170285461A1

## CPC

- G03F 1/64: characterised by the frames, e.g. structure or material, including bonding means therefor
- G03F 1/62: Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F 1/66: Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
- G03F 7/2004: {characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light}
- G03F 7/70983: {Optical system protection, e.g. pellicles or removable covers for protection of mask}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A pellicle is contaminated with dust or the like for various reasons during the production thereof. Especially, there is a problem that the risk that the dust or the like is attached is high during trimming or various other processes performed on a pellicle film. The present invention provides a method for producing a pellicle for EUV that decreases the attachment of dust or the like. A method for producing a pellicle includes forming a pellicle film on a substrate; trimming the substrate; and removing at least a part of the substrate after trimming the substrate. Before the part of the substrate is removed, at least particles attached to a surface of the pellicle film are removed.

## Claims

### Claim 1

A method for producing a pellicle, comprising:
forming a pellicle film on a substrate;
trimming the substrate; and
removing at least a part of the substrate after trimming the substrate.

### Claim 2 (depends on 1)

The method for producing a pellicle according to claim 1, further comprising:
removing at least particles attached to a surface of the pellicle film before removing the part of the substrate.

### Claim 3 (depends on 2)

The method for producing a pellicle according to claim 2, further comprising:
chamfering an end portion of the substrate before removing the particles.

### Claim 4 (depends on 1)

The method for producing a pellicle according to claim 1, wherein the step of removing at least the part of the substrate is a wet etching step.

### Claim 5 (depends on 3)

The method for producing a pellicle according to claim 3, further comprising forming a hole in at least the substrate before removing the particles.

### Claim 6 (depends on 3)

The method for producing a pellicle according to claim 3, further comprising forming a hole in at least the pellicle film and the substrate before removing the particles.

### Claim 7 (depends on 5)

The method for producing a pellicle according to claim 5, wherein the hole is formed by use of an ultra-short pulse laser.

### Claim 8 (depends on 6)

The method for producing a pellicle according to claim 6, wherein the hole is formed by use of an ultra-short pulse laser.

### Claim 9 (depends on 4)

The method for producing a pellicle according to claim 4, wherein a hole is formed by the wet etching step.

### Claim 10 (depends on 1)

The method for producing a pellicle according to claim 1, wherein the substrate is trimmed by use of an ultra-short pulse laser.

### Claim 11

A pellicle frame, comprising:
a pellicle film; and
a first frame;
wherein:
the pellicle film is extended over the first frame; and
the first frame includes at least one curved portion at an end portion thereof.

### Claim 12

A pellicle frame, comprising:
a pellicle film; and
a first frame;
wherein:
the pellicle film is extended over the first frame;
the first frame includes inclining surface at an end portion thereof; and
a top surface and the inclining surface of the first frame make an angle of 100 degrees to 170 degrees.

### Claim 13 (depends on 11)

A pellicle, comprising:
the pellicle frame according to claim 11; and
a second frame;
wherein:
the pellicle frame is connected with the second frame; and
the second frame includes a curved portion at an end portion thereof.