# US 2017/0283935 A1 · Coating film, manufacturing method for same, and pvd device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2017/0283935 A1 - Document ID: US20170283935A1 - Status: Published application - Kind: A1 - Application number: 15/511,639 - Filed: 2014-09-17 - Published: 2017-10-05 - Earliest claimed: 2014-09-17 - Assignees: Nippon Itf, Inc.; Nippon Piston Ring Co., Ltd. - Applicants: Nippon Itf, Inc.; Nippon Piston Ring Co., Ltd. - Inventors: Hideki MORIGUCHI; Tadashi SAITO; Yoshikazu TANAKA; Tetsumi ARAHI; Katsuaki OGAWA; Takahiro OKAZAKI; Hiroyuki SUGIURA; Yoshihiro ITO - Web page: https://patentgrep.com/patent/US20170283935A1 ## CPC - C23C 14/0605: {Carbon} - B82Y 40/00: Manufacture or treatment of nanostructures - C01B 32/05: Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30 - C01B 32/15: Nano-sized carbon materials - C23C 14/024: {Deposition of sublayers, e.g. to promote adhesion of the coating (C23C14/027 takes precedence)} - C23C 14/025: {Metallic sublayers} - C23C 14/06: characterised by the coating material ({C23C14/0021} , C23C14/04 take precedence) - C23C 14/325: {Electric arc evaporation} - C23C 14/505: {for rotation of the substrates} - C23C 14/541: {Heating or cooling of the substrates} - C23C 14/5833: {Ion beam bombardment} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES - C01B: NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; {METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C} ## Abstract Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance (defect resistance) and peeling resistance. This coating film coats a substrate surface, wherein a hard carbon layer is formed extending in columns-shape perpendicular to the substrate when observed in a cross-sectional bright-field TEM image, the hard carbon layer is formed using a PVD method, and the ID/IG ratio is 1-6 when the hard carbon layer is measured using Raman spectroscopy, said ratio being the ratio of the Raman spectrum D band peak area intensity and G band peak area intensity. ## Claims ### Claim 1 A coating film, coated on a substrate surface, wherein a hard carbon layer is formed continuing in columns-shape perpendicular to the substrate when observed in a cross-sectional bright-field TEM image, the hard carbon layer is formed using a PVD method, and the ID/IG ratio is 1-6 when the hard carbon layer is measured using Raman spectroscopy, said ratio being the ratio of the Raman spectrum D band peak area intensity and G band peak area intensity. ### Claim 2 (depends on 1) The coating film according to claim 1, wherein the hard carbon continuing in columns-shape perpendicular to the substrate has a width of 1 nm to 500 nm. ### Claim 3 (depends on 1) The coating film according to claim 1, wherein the hard carbon continuing in columns-shape perpendicular to the substrate displays a diffraction spot in electron beam diffraction of the cross section of the coating film. ### Claim 4 (depends on 1) The coating film according to claim 1, wherein the hard carbon continuing in columns-shape perpendicular to the substrate displays a diffraction spot in a position at lattice spacing of 0.3 nm to 0.4 nm in electron beam diffraction of the cross section of the coating film. ### Claim 5 (depends on 1) The coating film according to claim 1, wherein the hydrogen content of the columnar hard carbon layer is below 10 atom %. ### Claim 6 (depends on 1) The coating film according to claim 1, wherein the nano indentation hardness of the columnar hard carbon layer is 10 GPa to 35 GPa. ### Claim 7 (depends on 1) The coating film according to claim 1, wherein the sp2/sp3 ratio of the hard carbon extending in columns-shape perpendicular to the substrate is 0.3 to 0.9. ### Claim 8 (depends on 1) The coating film according to claim 1, wherein the columnar hard carbon layer further has a lower non-columnar hard carbon layer, and the sp2/sp3 ratio of the lower hard carbon layer is 0.1 to 0.3. ### Claim 9 (depends on 8) The coating film according to claim 8, wherein the nano indentation hardness of the lower hard carbon layer is 35 GPa to 80 GPa. ### Claim 10 (depends on 1) A manufacturing method for a coating film, using an arc PVD method, in a manner of maintaining a substrate temperature of 250-400° C., controlling the bias voltage, arc current, heater temperature and/or furnace pressure, and coating the substrate surface with a hard carbon film while rotating and/or revolving the substrate, thus manufacturing the coating film according to claim 1. ### Claim 11 (depends on 10) The manufacturing method for a coating film according to claim 10, wherein the bias voltage is −275 V to −400 V. ### Claim 12 (depends on 10) A PVD device, for use in the manufacturing method for a coating film according to claim 10, wherein the PVD device is an arc PVD device having a control mechanism that controls the substrate temperature of 250-400° C. ### Claim 13 (depends on 12) The PVD device according to claim 12, comprising: a substrate supporting mechanism that supports the substrate to make it rotate and revolve freely; and a rotary control mechanism that controls the speed of rotation and/or revolution of the substrate.