# US 2017/0282183 A1 · Fluid handling device

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- Number: US 2017/0282183 A1
- Document ID: US20170282183A1
- Status: Published application
- Kind: A1
- Application number: 15/474,572
- Filed: 2017-03-30
- Published: 2017-10-05
- Earliest claimed: 2016-03-31
- Assignees: Enplas Corporation
- Applicants: Enplas Corporation
- Inventors: Koichi ONO
- Web page: https://patentgrep.com/patent/US20170282183A1

## CPC

- B01L 3/502784: {specially adapted for droplet or plug flow, e.g. digital microfluidics}
- B01L 3/502707: {characterised by the manufacture of the container or its components}
- B01L 3/502715: {characterised by interfacing components, e.g. fluidic, electrical, optical or mechanical interfaces}
- F16K 99/0015: {Diaphragm or membrane valves}
- F16K 99/0028: {Valves having multiple inlets or outlets}
- F16K 99/0042: {Electric operating means therefor}
- B01L 2200/027: for microfluidic devices
- B01L 2200/0652: Sorting or classification of particles or molecules
- B01L 2200/0673: Handling of plugs of fluid surrounded by immiscible fluid
- B01L 2300/0816: Cards, e.g. flat sample carriers usually with flow in two horizontal directions
- B01L 2300/0864: comprising only one inlet and multiple receiving wells, e.g. for separation, splitting
- B01L 2300/0887: Laminated structure
- B01L 2400/0406: capillary forces
- B01L 2400/0415: electrical forces, e.g. electrokinetic
- B01L 2400/0487: fluid pressure, pneumatics
- F16K 2099/008: {Multi-layer fabrications}
- F16K 2099/0084: {Chemistry or biology, e.g. "lab-on-a-chip" technology}
- B01L: CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- F16K: VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING {(devices for emptying and evacuating the excess liquid in valves or conduits F16L55/07)}

## Abstract

A fluid handling device includes: a substrate including a first surface and a second surface which are opposite to each other, wherein a first recess which allows fluid to flow therethrough is formed on the first surface; a film including a third surface and a fourth surface which are opposite to each other, wherein at least a pair of second recesses is formed on the third surface; and at least a pair of electrodes whose shape is defined by the second recesses, the electrodes being disposed in the second recesses and configured to apply an electric field to an inside of the first recess, the film being joined to the substrate such that the first surface and the fourth surface face each other.

## Claims

### Claim 1

A fluid handling device comprising:
a substrate including a first surface and a second surface which are opposite to each other, wherein a first recess which allows fluid to flow therethrough is formed on the first surface;
a film including a third surface and a fourth surface which are opposite to each other, wherein at least a pair of second recesses is formed on the third surface; and
at least a pair of electrodes whose shape is defined by the second recesses, the electrodes being disposed in the second recesses and configured to apply an electric field to an inside of the first recess,
the film being joined to the substrate such that the first surface and the fourth surface face each other.

### Claim 2 (depends on 1)

The fluid handling device according to claim 1, wherein:
the film has a thickness of 30 μm to 200 μm, both inclusive; and
the second recess has a depth of 20 μm to 190 μm, both inclusive, the depth of the second recess being smaller than the thickness of the film.

### Claim 3 (depends on 1)

The fluid handling device according to claim 1, wherein the electrode includes a conductive ink.

### Claim 4 (depends on 2)

The fluid handling device according to claim 2, wherein the electrode includes a conductive ink.

### Claim 5 (depends on 1)

The fluid handling device according to claim 1, wherein the electrode includes a metal whose fusing point is 200° C. or below.

### Claim 6 (depends on 2)

The fluid handling device according to claim 2, wherein the electrode includes a metal whose fusing point is 200° C. or below.