# US 2017/0256398 A1 · Substrate processing apparatus, substrate processing method, and storage medium

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- Number: US 2017/0256398 A1
- Document ID: US20170256398A1
- Status: Published application
- Kind: A1
- Application number: 15/443,306
- Filed: 2017-02-27
- Published: 2017-09-07
- Earliest claimed: 2016-03-03
- Assignees: Tokyo Electron Limited
- Applicants: Tokyo Electron Limited
- Inventors: Hiroaki Inadomi; Satoshi Okamura; Satoshi Biwa
- Web page: https://patentgrep.com/patent/US20170256398A1

## CPC

- H10P 70/80: {Cleaning only by supercritical fluids}
- B08B 3/08: the liquid having chemical or dissolving effect
- B08B 7/0021: {by liquid gases or supercritical fluids}
- H10P 72/0411: {for wet cleaning or washing}
- H10P 72/0434: {mainly by convection}
- H10P 72/3302: {Mechanical parts of transfer devices}
- H10P 72/3306: {Horizontal transfer of a single workpiece}
- H10P 72/7612: {characterised by lifting arrangements, e.g. lift pins}
- H10P 72/7624: {characterised by the mechanical construction of the susceptor, stage or support}
- H10P 70/18: {by combined dry cleaning and wet cleaning (H10P70/52 takes precedence)}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL

## Abstract

Disclosed is a substrate processing apparatus. The substrate processing apparatus includes a container body, and a holding member that conveys the substrate from an outside of the container body into the container body and holds the substrate inside the container body during the processing. A substrate support pin supporting a wafer and a cooling plate cooling the holding member are provided outside the container body.

## Claims

### Claim 1

A substrate processing apparatus comprising:
a container body in which a processing is performed on a substrate;
a holding member that conveys the substrate from the outside of the container body into the container body and holds the substrate inside the container body during the processing;
a substrate support pin that is positioned outside the container body and supports a cooling member configured to cool the holding member and the substrate; and
a lift mechanism that moves up and down the cooling member and the substrate support pin with respect to the holding member.

### Claim 2 (depends on 1)

The substrate processing apparatus of claim 1, wherein the cooling member cools the holding member by being in direct contact with the holding member.

### Claim 3 (depends on 2)

The substrate processing apparatus of claim 2, wherein the lift mechanism includes a cooling member support pin that moves up the cooling member through a spring.

### Claim 4 (depends on 3)

The substrate processing apparatus of claim 3, wherein the lift mechanism includes the substrate support pin that extends to penetrate the cooling member and supports the substrate.

### Claim 5 (depends on 1)

The substrate processing apparatus of claim 1, wherein the cooling member has an elastic material on a surface thereof.

### Claim 6 (depends on 1)

The substrate processing apparatus of claim 1, wherein the lift mechanism includes a first lift mechanism that moves up and down the cooling member and a second lift mechanism that moves up and down the substrate support pin, and the first and second lift mechanisms independently perform an up-and-down movement operation.

### Claim 7 (depends on 1)

The substrate processing apparatus of claim 1, wherein the substrate processing container is a substrate processing container for a supercritical processing.

### Claim 8

A substrate processing method comprising:
providing a substrate processing apparatus that includes: a container body in which a processing is performed on a substrate; a holding member that conveys the substrate from the outside of the container body into the container body and holds the substrate inside the container body during the processing; a substrate support pin that is positioned outside the container body and supports a cooling member configured to cool the holding member and the substrate; and a lift mechanism that moves up and down the cooling member and the substrate support pin with respect to the holding member;
conveying the substrate from the outside of the container body into the container body by the holding member;
performing a processing while holding the substrate inside the substrate processing container by the holding member;
cooling the holding member by discharging the substrate on the holding member outward, operating the lift mechanism to move up the substrate by the substrate support pin, and simultaneously, causing the cooling member to approach the holding member; and
placing a new substrate on the holding member.

### Claim 9

A non-transitory computer-readable storage medium storing a computer executable program that, when executed, causes a computer to control a substrate processing method including:
providing a substrate processing apparatus that includes: a container body in which a processing is performed on a substrate; a holding member that conveys the substrate from the outside of the container body into the container body and holds the substrate inside the container body during the processing; a substrate support pin that is positioned outside the container body and supports a cooling member configured to cool the holding member and the substrate; and a lift mechanism that moves up and down the cooling member and the substrate support pin with respect to the holding member;
conveying the substrate from the outside of the container body into the container body by the holding member; performing a processing while holding the substrate inside the substrate processing container by the holding member;
cooling the holding member by discharging the substrate on the holding member to the outside and operating the lift mechanism to move up the substrate by the substrate support pin and simultaneously causing the cooling member to approach the holding member; and
placing a new substrate on the holding member.