# US 2017/0255106 A1 · Shutter unit, lithography apparatus, and method of manufacturing article

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 2017/0255106 A1
- Document ID: US20170255106A1
- Status: Published application
- Kind: A1
- Application number: 15/444,418
- Filed: 2017-02-28
- Published: 2017-09-07
- Earliest claimed: 2016-03-03
- Assignees: Canon Kabushiki Kaisha
- Applicants: Canon Kabushiki Kaisha
- Inventors: Atsushi Hatamoto
- Web page: https://patentgrep.com/patent/US20170255106A1

## CPC

- G03F 7/7015: {Details of optical elements}
- G03F 7/70058: {Mask illumination systems}
- G03F 7/70191: {Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like}
- G03F 7/70558: {Dose control, i.e. achievement of a desired dose}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A shutter unit that opens and closes an optical path of light for a lithography apparatus is provided. The shutter unit includes a motor which rotatably drives a shaft extended along a rotation axis of the motor, and a plurality of shutter members attached to the shaft, each including a light shielding portion and a light transmissive portion. The shutter unit further includes a partition plate arranged at a location between the shutter members to avoid a portion through which a light beam passes and configured to shield light that has leaked from a front stage shutter member.

## Claims

### Claim 1

A shutter unit that opens and closes an optical path of light for a lithography apparatus, comprising:
a motor configured to rotatably drive a shaft extended along a rotation axis of the motor;
a plurality of shutter members attached to the shaft, each including a light shielding portion and a light transmissive portion and configured to open and close the optical path by rotating in a direction in which the light shielding portion and the light transmissive portion cross the optical path; and
a partition plate arranged at a location between the plurality of shutter members to avoid a portion through which a light beam passes and configured to shield light that has leaked from a front stage shutter member.

### Claim 2 (depends on 1)

The shutter unit according to claim 1, further comprising a second partition plate that is arranged in front of a frontmost stage shutter member of the plurality of shutter members when viewed from the side of a light source.

### Claim 3 (depends on 2)

The shutter unit according to claim 2, further comprising a third partition plate that is arranged behind a rearmost stage shutter member of the plurality of shutter members when viewed from the side of the light source.

### Claim 4 (depends on 1)

The shutter unit according to claim 1, wherein a shutter member of the plurality of shutter members other than a frontmost stage shutter member when viewed from the side of a light source includes a light absorbing member configured to absorb incident light.

### Claim 5 (depends on 1)

The shutter unit according to claim 1, wherein the rotation axis is obliquely arranged with respect to the optical path.

### Claim 6

A lithography apparatus that forms a pattern of an original on a substrate, comprising:
an illumination optical system configured to illuminate the original,
the illumination optical system including a shutter unit configured to open and close an optical path of a light,
the shutter unit including
a motor configured to rotatably drive a shaft extended along a rotation axis of the motor,
a plurality of shutter members attached to the shaft, each including a light shielding portion and a light transmissive portion and configured to open and close the optical path by rotating in a direction in which the light shielding portion and the light transmissive portion cross the optical path, and
a partition plate arranged at a location between the plurality of shutter members to avoid a portion through which a light beam passes and configured to shield a light that has leaked from a front stage shutter.

### Claim 7

A method of manufacturing an article, comprising:
forming a pattern of an original on a substrate by using a lithography apparatus; and
processing the substrate on which the pattern has been formed by the forming,
the lithography apparatus including an illumination optical system configured to illuminate the original,
the illumination optical system including a shutter unit configured to open and close an optical path of a light,
the shutter unit including
a motor configured to rotatably drive a shaft extended along a rotation axis of the motor,
a plurality of shutter members attached to the shaft, each including a light shielding portion and a light transmissive portion and configured to open and close the optical path by rotating in a direction in which the light shielding portion and the light transmissive portion cross the optical path, and
a partition plate arranged at a location between the plurality of shutter members to avoid a portion through which a light beam passes and configured to shield a light that has leaked from a front stage shutter.