Method for manufacturing multilayer crown-shaped mim capacitor

A method for fabricating a multi-layer, crown-shaped metal-insulator-metal (MIM) capacitor, comprising:

• providing a base having therein a conductive region disposed within a capacitor-forming region;
• depositing an inter-metal dielectric (IMD) layer on the base and covering the capacitor-forming region;
• forming a capacitor trench within the capacitor-forming region, the capacitor trench penetrating through the IMD layer, thereby exposing a portion of the conductive region;
• forming a concentric capacitor lower electrode structure within the capacitor trench, the concentric capacitor lower electrode structure including a first electrode and a second electrode surrounded by the first electrode, wherein the first electrode is in direct contact with the conductive region;
• forming a conductive supporting pedestal within the capacitor trench for fixing and electrically connecting bottom portions of the first and second electrodes, wherein the conductive supporting pedestal comprising an inner portion situated at the bottom portion of the second electrode and an annular outer portion situated between the first electrode and the second electrode, and wherein the inner portion is not in direct contact with the annular outer portion;
• forming a capacitor dielectric layer conformally lining the first and second electrodes and a top surface of the conductive supporting pedestal;
• and
• forming a capacitor upper electrode on the capacitor dielectric layer.