Imaging system and manufacturing apparatus

An imaging system comprising:

• an imaging element comprising a pixel;
• and
• a light source configured to emit first ultraviolet light to an object,
• wherein the pixel comprises a first transistor, a second transistor, a third transistor, and a fourth transistor,
• wherein one of a source and a drain of the first transistor, one of a source and a drain of the second transistor, and a gate of the third transistor are electrically connected to a node,
• wherein one of a source and a drain of the third transistor is electrically connected to one of a source and a drain of the fourth transistor,
• wherein the first transistor is configured to change a potential of the node when the first transistor is irradiated with second ultraviolet light reflected or transmitted by the object, and
• wherein the first transistor is configured to retain the potential of the node when the first transistor is not irradiated with the second ultraviolet light.