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US 2017/0250095 A1Published application
Substrate cleaning apparatus and substrate processing facility having the same
AssigneeSamsung Electronics Co., Ltd.
InventorTea-Geon KIM
Life of this patent
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Abstract
A substrate cleaning apparatus includes a porous suction part having a polygonal pillar shape with a plurality of cleaning surfaces, a transfer unit to transfer a substrate with a plurality of semiconductor devices toward the porous suction part, and to contact the semiconductor devices with one of the plurality of cleaning surfaces, and a rotation driving part to rotate the porous suction part.
Claims20
A substrate cleaning apparatus, comprising:
- a porous suction part having a polygonal pillar shape with a plurality of cleaning surfaces;
- a transfer unit to transfer a substrate with a plurality of semiconductor devices toward the porous suction part, and to contact the semiconductor devices with one of the plurality of cleaning surfaces;
- and
- a rotation driving part to rotate the porous suction part.
1 more element
A substrate processing system, comprising:
- a substrate cleaning apparatus to remove contaminants from semiconductor devices on a substrate;
- and
- a drying apparatus to dry the substrate after the substrate cleaning substrate,
- wherein the substrate cleaning apparatus includes:
- a porous suction part having a polygonal pillar shape with a plurality of cleaning surfaces,
- a transfer unit to transfer a substrate with a plurality of semiconductor devices toward the porous suction part, and to contact the semiconductor devices with one of the plurality of cleaning surfaces, and
- a rotation driving part to rotate the porous suction part.
4 more elements
A substrate cleaning apparatus, comprising:
- a rotatable porous pillar having a polygonal shape with a plurality of cleaning surfaces;
- and
- a transfer unit to contact semiconductor devices on a substrate with one or more of the plurality of cleaning surfaces during rotation of the porous pillar.
Dependencies are inferred from the claim text.