Dust collecting apparatus, substrate processing system, and method of manufacturing semiconductor device

A substrate processing system comprising:

• a container configured to contain a fluid that includes particles to be collected;
• one or more sound sources configured to generate, in the container, a standing sound wave including at least one node to trap the particles in a vicinity of the node;
• and
• a substrate processing apparatus configured to process a substrate with the fluid discharged from the container,
• wherein
• the one or more sound sources are configured to generate the standing sound wave so that the node does not contact a wall face of the container or contacts a predetermined portion of the wall face of the container, and
• the predetermined portion is formed of a member that prevents the particles from leaving from the node located in a vicinity of the predetermined portion.

A method of manufacturing a semiconductor device, comprising:

• containing, in a container, a fluid that includes particles to be collected;
• generating, in the container, a standing sound wave including at least one node by one or more sound sources to trap the particles in a vicinity of the node;
• and
• processing a substrate with the fluid discharged from the container,
• wherein
• the one or more sound sources generate the standing sound wave so that the node does not contact a wall face of the container or contacts a predetermined portion of the wall face of the container, and
• the predetermined portion is formed of a member that prevents the particles from leaving from the node located in a vicinity of the predetermined portion.