Plasma processing system workpiece carrier with thermally isolated heater plate blocks

A plasma processing chamber comprising:

• a chamber housing defining a plasma processing region of the plasma processing chamber;
• an inlet defined at a top of the plasma processing chamber, wherein the inlet is configured to receive precursors into the chamber;
• a substrate support, comprising:
• a puck,
• a heater plate having a plurality of thermally isolated blocks each thermally coupled to the puck, wherein each block includes a heater to heat a respective block of the heater plate, and
• a cooling plate fastened to and thermally coupled to the heater plate, the cooling plate defining a cooling channel configured to distribute a heat transfer fluid to transfer heat from the cooling plate;
• and
• a temperature controller to independently control each heater.

A processing chamber comprising:

• a chamber housing defining a plasma processing region of the processing chamber;
• an inlet defined at a top of the processing chamber, wherein the inlet is configured to receive precursors into the chamber;
• a substrate support, comprising:
• a puck,
• a heater plate having a plurality of thermally isolated blocks each thermally coupled with the puck, wherein each block includes a heater to heat a respective block of the heater plate, and
• a cooling plate thermally coupled with the heater plate, the cooling plate defining a cooling channel configured to distribute a heat transfer fluid to transfer heat from the cooling plate;
• a temperature controller to independently control each heater;
• and
• a distributor positioned within the chamber housing, wherein the distributor is electrically coupled with a plasma source configured to generate a plasma within the processing chamber.