Plasma processing apparatus and precoating method

A precoating method comprising:

• providing a plasma processing apparatus that includes:
• a processing container;
• a partition plate that has a plurality of holes each having a maximum width that is two times or less a sheath length corresponding to plasma of a plasma excitation gas, and partitions an inside of the processing container into a plasma generation chamber and a processing chamber;
• a first gas supply unit that supplies the plasma excitation gas to the plasma generation chamber;
• a second gas supply unit that supplies a precoating gas to at least one of the plasma generation chamber and the processing chamber;
• a first plasma source that generates plasma of the plasma excitation gas supplied into the plasma generation chamber by the first gas supply unit;
• and a second plasma source that generates plasma of the precoating gas supplied into the processing chamber by the second gas supply unit or plasma of the precoating gas supplied into the plasma generation chamber by the second gas supply unit and introduced into the processing chamber through the plurality of holes of the partition plate;
• and
• causing the second plasma source to generate the plasma of the precoating gas before a plasma processing using the plasma of the plasma excitation gas is performed such that a precoating is performed on a surface of the partition plate on a side of the processing chamber.