High purity metallic top coat for semiconductor manufacturing components
AssigneeApplied Materials, Inc.
InventorsJennifer Y. Sun, Vahid Firouzdor
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Abstract
A component for a manufacturing chamber comprises a cold spray coating and an anodization layer on the cold spray coating. The anodization layer has a thickness of about 2-10 mil. The anodization layer comprises a low porosity bottom layer portion having a porosity that is less than about 40-50% and a porous columnar top layer portion having a porosity of about 40-40% and comprising a plurality of columnar nanopores having a diameter of about 10-50 nm.
Claims20
An article comprising:
- a component for a manufacturing chamber;
- a cold spray coating on the component;
- and
- an anodization layer formed on the cold spray coating, the anodization layer having a thickness of about 2-10 mil, wherein the anodization layer comprises a low porosity layer portion having a porosity that is less than about 40-50% and a porous columnar layer portion having the porosity of about 40-50% and comprising a plurality of columnar nanopores having a diameter of about 10-50 nm.
An article comprising a component in a manufacturing chamber, a coating on a surface of the component, and an anodization layer on the coating, the article having been manufactured by a process comprising:
- cold spray coating a metal powder onto the surface of the article to form the coating on the surface of the article;
- and
- anodizing the coating to form the anodization layer, the anodization layer having a thickness of about 2-10 mil, wherein the anodization layer comprises a plurality of columnar nanopores having a diameter of about 10-50 nm, wherein at least a portion of the anodization layer has a porosity of about 40-50%, and wherein anodizing the coating comprises:
- applying a first current density during a start of the anodizing to form a low porosity layer portion of the anodization layer, the low porosity layer portion having a porosity that is less than the porosity of about 40-50%;
- and
- applying a second current density that is lower than the first current density during a remainder of the anodizing to form a porous columnar layer portion of the anodization layer, the porous columnar layer portion comprising the plurality of columnar nanopores and having the porosity of about 40-50%.
Dependencies are inferred from the claim text.