Single chamber multi-partition deposition tool and method of operating same

A reactor system comprising multiple partitions within a single continuous vacuum enclosure, wherein:

• each of the multiple partitions is defined by respective distinct volumes within the single continuous vacuum enclosure that are connected thereamongst for unhindered movement of at least one substrate therethrough;
• a first subset of the multiple partitions comprise processing spaces configured to provide a respective process gas that provides a process selected from adsorption and reaction;
• a second subset of the multiple partitions comprising purge spaces configured to provide a respective purge gas flow pattern therein between at least one respective purge gas inlet and a respective vacuum port and to provide isolation between process gases between a respective neighboring pair of processing spaces;
• and
• at least one substrate carrier is configured to sequentially move through each of the multiple partitions in a cyclic pattern employing a sequence in which the processing spaces alternate with the purge spaces.