Salt and photoresist composition containing the same
AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro MASUYAMA, Natsuki OKADA, Koji ICHIKAWA
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AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro MASUYAMA, Natsuki OKADA, Koji ICHIKAWA
Estimating the term…
A salt having a group represented by the formula (aa): wherein Xa and Xb independently each represent an oxygen atom or a sulfur atom, the ring W represents a C3-C36 heterocyclic ring which has an ester bond or a thioester bond, said heterocyclic ring optionally further having an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group each by which a methylene group has been replaced, and said heterocycilic ring optionally having a hydroxyl group, a cyano group, a carboxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C2-C13 alkoxycarbonyl group, a C2-C13 acyl group, a C2-C13 acyloxy group, a C3-C12 alicyclic hydrocarbon group, a C6-C10 aromatic hydrocarbon group or any combination of these groups each by which a hydrogen atom has been replaced, and * represents a binding position.
A salt having a group represented by the formula (aa):
Dependencies are inferred from the claim text.