Imprint apparatus, method for manufacturing article, and exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorsMasami Yonekawa, Yoichi Matsuoka
Life of this patent
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Abstract
There is provided an imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold, the imprint apparatus including a mold holding unit configured to hold the mold, and a substrate holding unit configured to hold the substrate, in which a particle is captured by generating a first region and a second region charged to different polarities in at least either one of a peripheral region of a region covered by the mold of the mold holding unit and a peripheral region of a region covered by the substrate of the substrate holding unit.
Claims11
An imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold, the imprint apparatus comprising:
- a mold holding unit configured to hold the mold;
- and
- a substrate holding unit configured to hold the substrate,
- wherein a particle is captured by generating a first region and a second region charged to different polarities in at least either one of a peripheral region of a region covered by the mold of the mold holding unit and a peripheral region of a region covered by the substrate of the substrate holding unit.
A method for manufacturing an article, the method comprising:
- forming, by using an imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold, a pattern of a cured imprint material on the substrate;
- and
- processing the substrate with a pattern formed thereon in the forming to manufacture the article,
- wherein the imprint apparatus includes:
- a mold holding unit configured to hold the mold;
- and
- a substrate holding unit configured to hold the substrate, and
- wherein a particle is captured by generating a first region and a second region charged to different polarities in at least either one of a peripheral region of a region covered by the mold of the mold holding unit and a peripheral region of a region covered by the substrate of the substrate holding unit.
An exposure apparatus comprising:
- an optical system configured to project onto a substrate a pattern formed on an original plate;
- and
- a holding apparatus configured to hold the original plate or the substrate,
- wherein the holding apparatus includes a holding unit configured to hold the original plate or the substrate, and
- wherein a particle is captured by generating a first region and a second region charged to different polarities in a peripheral region of a region covered by the original plate held by the holding unit.
Dependencies are inferred from the claim text.