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US 2017/0246468 A1Published application
Methods and systems for controlling or tuning the electric field generated in skin or tissue during cold plasma skin treatments
AssigneeEP Technologies, Inc.
InventorsSameer Kalghatgi, Tsung-Chan Tsai, Jeffrey S. Louis, Robert L. Gray
Life of this patent
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Abstract
Exemplary systems and methods associated with skin treatments using non-thermal plasma to porate skin or tissues using conductive elements to direct an electric field through targeted regions of the skin or tissue. Various configurations of conductive elements and associated circuitry may be used to tune and control the electric field.
Claims20
An apparatus for controlling an electric field associated with a skin treatment, comprising:
- a plasma generating device for generating a plasma;
- a power supply for powering the plasma generating device;
- first circuitry for providing one or more first electrical pulses to the plasma generating device;
- a first conductive element capable of placement in contact with the skin for affecting the electric field associated with the generated plasma;
- wherein at least a portion of the electric field is directed through a first region of the skin by the plasma and the first conductive element.
2 more elements
A method of treating skin comprising:
- applying a first conductive element in contact with the skin;
- and
- applying a plasma to the skin, wherein the first conductive element affects the electric field associated with the plasma;
- wherein at least a portion of an electric field is directed through a first region of the skin by the plasma and the first conductive element.
1 more element
A method of tuning a skin treatment apparatus, comprising:
- providing circuitry associated with a first conductive element;
- applying the first conductive element in contact with a skin;
- applying a plasma to the skin using the skin treatment apparatus, wherein at least a portion of an electric field is directed through the skin by the plasma and the first conductive element;
- wherein the circuitry affects the electric field associated with the plasma;
- and
- adjusting the circuitry to change a characteristic of the electric field.
3 more elements
Dependencies are inferred from the claim text.