Ultra-thin corrosion resistant hard overcoat for hard disk media
AssigneeIntevac, Inc.
InventorTerry Bluck
Life of this patent
Estimating the term…
Abstract
A magnetic media disk is fabricated by depositing magnetic layers over the disk, then depositing protective later over the magnetic layer, and then performing ion implant process to implant ions into the protective coating. A system for performing the ion implant of the magnetic media disk includes two ion implant chambers. During operation one chamber performs ion implant and one chamber performs chamber cleaning by maintaining inside a plasma of cleaning gas without a disk present inside the chamber.
Claims20
A magnetic hard disk used for data storage, comprising:
- a disk-shaped substrate;
- a plurality of magnetic layers formed on the substrate;
- a protective layer having molecules interconnected by inter-molecules bonds and implanted ions positioned among the inter-connected molecules but having no bonds to the interconnected molecules.
A method for fabricating a hard disk for magnetic media hard disk drive, comprising:
- depositing a magnetic film stack on a disk-shaped substrate;
- depositing a diamond-like carbon (DLC) coating over the magnetic film stack;
- implanting ions into the DLC coating.
A system for performing ion implant, comprising:
- a first ion implant chamber, a second implant chamber, and a high vacuum isolation valves in between the first and second ion implant chambers;
- a process gas source coupled to the first and second ion implant chambers through a first toggle valve having its open position selectively flowing process gas to only one of the first and second ion implant chambers at a given position;
- a cleaning gas source coupled to the first and second ion implant chambers through a second toggle valve having its open position selectively flowing cleaning gas to only one of the first and second ion implant chambers at a given position;
- wherein the first and second toggle valve are configured to operate exclusively counter-synchronously.
An ion implant chamber, comprising:
- a processing chamber having transport track for transport a substrate carrier, thereby defining a substrate position within the processing chamber;
- a plasma cage having a window enabling fluid communication between the plasma cage and the processing chamber;
- a grid assembly positioned in the window, thereby confining the plasma inside the plasma cage;
- a biased electrode assembly positioned inside the processing chamber between the grid and the substrate position.
Dependencies are inferred from the claim text.