Systems And Methods For Extended Infrared Spectroscopic Ellipsometry
AssigneeKLA-Tencor Corporation
InventorsShankar Krishnan, David Y. Wang
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AssigneeKLA-Tencor Corporation
InventorsShankar Krishnan, David Y. Wang
Estimating the term…
Methods and systems for performing simultaneous spectroscopic measurements of semiconductor structures at ultraviolet, visible, and infrared wavelengths are presented herein. In another aspect, wavelength errors are reduced by orienting the direction of wavelength dispersion on the detector surface perpendicular to the projection of the plane of incidence onto the detector surface. In another aspect, a broad range of infrared wavelengths are detected by a detector that includes multiple photosensitive areas having different sensitivity characteristics. Collected light is linearly dispersed across the surface of the detector according to wavelength. Each different photosensitive area is arranged on the detector to sense a different range of incident wavelengths. In this manner, a broad range of infrared wavelengths are detected with high signal to noise ratio by a single detector. These features enable high throughput measurements of high aspect ratio structures with high throughput, precision, and accuracy.
A metrology system comprising:
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