Magnetic nanomechanical devices for stiction compensation

A nanoelectromechanical (NEMS) device, comprising:

• a substrate;
• a source region disposed above or formed in the substrate;
• a drain region disposed above or formed in the substrate;
• and
• a gate region disposed above or formed in the substrate, the gate region having a first magnetic layer, wherein the source region includes a cantilever having a second magnetic layer with the cantilever bending from a first position to a second position in contact with the drain region when a voltage is applied to the gate region.

A method for fabricating a nanoelectromechanical (NEMS) device with nanomagnets, comprising:

• forming at least one nonmagnetic metal layer on a substrate;
• forming a first ferromagnetic metal layer on the at least one nonmagnetic metal layer;
• forming a first dielectric layer on the ferromagnetic layer;
• depositing a second dielectric layer on the first dielectric layer;
• forming a second ferromagnetic metal layer on the second dielectric layer;
• depositing a polysilicon layer on the second ferromagnetic layer;
• etching regions of the polysilicon layer, the second ferromagnetic layer, and the second dielectric layer that are not masked by the photoresist to form a cantilever that bends from a first position to a second position towards the substrate when a voltage is applied to the cantilever.