Cylinder etching apparatus

A cylinder etching method, comprising:

• providing a cylinder etching apparatus comprising a processing bath, a chuck means for rotatably holding both ends of a cylinder to be processed in a longitudinal direction of the cylinder to be processed and for accommodating the cylinder to be processed in the processing bath, at least one etching solution supply tube arranged at a predetermined distance from an outer peripheral surface of the cylinder to be processed along the longitudinal direction in parallel to the outer peripheral surface of the cylinder to be processed along the longitudinal direction and a plurality of ejection nozzles juxtaposed in the at least one etching solution supply tube, said plurality of ejection nozzles being configured to eject an etching solution from the at least one etching solution supply tube, wherein the etching solution ejected from the plurality of ejection nozzles through the at least one etching solution supply tube is caused to impinge against a surface of the cylinder to be processed, wherein the plurality of ejection nozzles are oriented obliquely upward with respect to a horizontal direction of the cylinder to be processed, wherein an ejection direction of each of the plurality of ejection nozzles is oriented toward a rotation center of the cylinder to be processed from a position that is obliquely downward of the cylinder to be processed, wherein the plurality of ejection nozzles are arranged so as to be brought closer to and away from the outer peripheral surface of the cylinder to be processed;
• etching the outer peripheral surface of the cylinder to be processed through use of the cylinder etching apparatus.

A cylinder etching method, comprising:

• providing a cylinder etching apparatus comprising a processing bath, a chuck means for rotatably holding both ends of a cylinder to be processed in a longitudinal direction of the cylinder to be processed and for accommodating the cylinder to be processed in the processing bath, at least one etching solution supply tube arranged at a predetermined distance from an outer peripheral surface of the cylinder to be processed along the longitudinal direction in parallel to the outer peripheral surface of the cylinder to be processed along the longitudinal direction and a plurality of ejection nozzles juxtaposed in the at least one etching solution supply tube, said plurality of ejection nozzles being configured to eject an etching solution from the at least one etching solution supply tube, wherein the etching solution ejected from the plurality of ejection nozzles through the at least one etching solution supply tube is caused to impinge against a surface of the cylinder to be processed, wherein the plurality of ejection nozzles are oriented obliquely upward with respect to a horizontal direction of the cylinder to be processed, wherein an ejection direction of each of the plurality of ejection nozzles is oriented toward a rotation center of the cylinder to be processed from a position that is obliquely downward of the cylinder to be processed, wherein the plurality of ejection nozzles are arranged so as to be brought closer to and away from the outer peripheral surface of the cylinder to be processed;
• using the cylinder etching apparatus to etch the cylinder.