Photosensitive composition for permanent films, resist material and coating film

A photosensitive composition for permanent films, comprising:

• a hydroxynaphthalene novolac resin having a structural portion (I) represented by the following General Formula (1) as a repeating unit and containing a hydroxynaphthalene (A) represented by the following General Formula (2) in an amount of 2% by mass or less in terms of the solid content of the resin,
• provided that the photosensitive composition does not contain a curing agent, or contains a curing agent in an amount of 50 parts by mass or less with respect to 100 parts by mass of the hydroxynaphthalene novolac resin:
• wherein R1 represents a hydrogen atom, an alkyl group, an alkoxy group, an aryl group which may have a substituent, an aralkyl group which may have a substituent, or a halogen atom, a plurality of R1's may be the same as or different from each other,
• R2 represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent,
• p represents 1 or 2, and
• q represents 4 or 5,
• with the proviso that the sum of p and q is 6:
• wherein R1, p, and q are as defined in General Formula (1).