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US 2017/0021607 A1Published application
Imprint apparatus and imprint method
AssigneeKabushiki Kaisha Toshiba
InventorsYasuo MATSUOKA, Hiroshi NOMURA, Masahito HIROSHIMA
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Abstract
An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process.
Claims20
An imprint apparatus comprising:
- a contact processing unit that brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate;
- and
- a defect determination unit that determines a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process.
An imprint method comprising:
- performing an imprint process of transferring a template pattern that is formed on a front surface of a template to a resist that is provided on a substrate;
- and
- determining a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process.
Dependencies are inferred from the claim text.