Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film

A process for nano-structuring a block copolymer film into nano-domains from a basic block copolymer non-structured at a determined temperature and having at least one block comprising styrene and at least one other block comprising methyl methacrylate, said process comprising the following steps:

• synthesizing said block copolymer by incorporating at least one co-monomer in each of the blocks of said basic block copolymer, said block copolymer then meeting following modified formula (I):
• (Aα(i)-co-Cγ)n-b-(Bβ(k)-co-Dδ)n-1-b-(Aα(i+1)-co-Eε)n-2-b-(Bβ(k+1)-co-Fζ)n-3-b- . . . -b-(Bβ(k+x)-co-Wω)n-p (I)
• where:
• “n” represents the number of blocks of the block copolymer,
• “A” represents styrene and “B” represents methyl methacrylate, or conversely;
• “C”, “D”, “E”, “F”, . . . , “W” respectively represent co-monomers or mixtures of co-monomers incorporated in each of the blocks of the block copolymer, the co-monomer or mixture of co-monomers incorporated in a styrene block differing from the co-monomer or mixture of co-monomers incorporated in a methyl methacrylate block,
• the subscripts αi and βk represent the number of units of styrene or methyl methacrylate monomers contained in each block of the block copolymer, and are all independent of one another,
• the subscripts γ, δ, ε, ζ . . . , and ω represent the number of co-monomer units in a given block and are all independent of one another,
• the subscripts αi, βk, γ, δ, ε, ζ . . . , and ω all greater than or equal to 1,
• applying a solution of said block copolymer in film form onto a surface,
• evaporating the solvent from the solution and annealing at said determined temperature.