# US 2016/0365221 A1 · Analyzing energy of charged particles > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2016/0365221 A1 - Document ID: US20160365221A1 - Status: Published application - Kind: A1 - Application number: 15/183,061 - Filed: 2016-06-15 - Published: 2016-12-15 - Earliest claimed: 2015-06-15 - Assignees: Carl Zeiss Microscopy GmbH - Applicants: Carl Zeiss Microscopy GmbH - Inventors: Dirk Preikszas - Web page: https://patentgrep.com/patent/US20160365221A1 ## CPC - H01J 37/28: with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} - H01J 37/10: Lenses - H01J 37/1475: {magnetic} - H01J 37/21: Means for adjusting the focus - H01J 37/244: Detectors; Associated components or circuits therefor - H01J 2237/05: Arrangements for energy or mass analysis - H01J 2237/24475: Scattered electron detectors - H01J 2237/24485: Energy spectrometers - H01J 2237/2449: Detector devices with moving charges in electric or magnetic fields - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract An analysis device, possibly having an electrostatic and/or magnetic lens, analyzes the energy of charged particles and has an opposing field grid device to which a voltage is applied in such a way that a portion of the charged particles is reflected by the opposing field grid device. Another portion of the charged particles passes through the opposing field grid device and is detected by a detector. The opposing field grid device has a curvature. A center of curvature is an intersection point of an optical axis with the opposing field grid device. The curvature has a radius of curvature which is given by the section between the center of curvature and a starting point on the optical axis. The opposing field grid device is curved in the direction of the starting point as viewed from the center of curvature and/or is arranged to be displaceable along the optical axis. ## Claims ### Claim 1 An analysis device for analyzing the energy of charged particles, comprising: at least one detector for detecting the charged particles, wherein the detector has a detection area on which impinge the charged particles which move in a direction of incidence toward the detector; at least one opposing field grid device to which a voltage is applied in such a way that a portion of the charged particles is reflected by the opposing field grid device and not detected by the detector; at least one electrostatic and/or magnetic lens, wherein proceeding from the detector, as viewed in a direction opposite to the direction of incidence of the charged particles, firstly the detector, then the opposing field grid device and then the electrostatic and/or magnetic lens are arranged, wherein the opposing field grid device has a curvature; at least one optical axis which extends through the opposing field grid device; a center of curvature of the opposing field grid device, wherein the center of curvature is an intersection point of the optical axis with the opposing field grid device, and wherein the curvature has a radius of curvature which is given by the section between the center of curvature and a starting point on the optical axis, wherein the opposing field grid device is curved in the direction of the starting point as viewed from the center of curvature and wherein the analysis device has one of the following features: the electrostatic and/or magnetic lens is arranged along the optical axis downstream of the starting point as viewed in the direction of incidence of the charged particles; the starting point is arranged along the optical axis between the electrostatic and/or magnetic lens and the center of curvature; or the starting point is arranged along the optical axis downstream of the electrostatic and/or magnetic lens and downstream of the center of curvature as viewed in the direction of incidence of the charged particles. ### Claim 2 (depends on 1) The analysis device as claimed in claim 1, wherein the analysis device has one of the following features: a crossover of the charged particles is arranged on the optical axis downstream of the starting point and upstream of the electrostatic and/or magnetic lens as viewed in the direction of incidence of the charged particles; a crossover of the charged particles is arranged downstream of the starting point as viewed in the direction of incidence of the charged particles, wherein the starting point is arranged downstream of the electrostatic and/or magnetic lens as viewed in the direction of incidence of the charged particles; or a crossover of the charged particles is arranged upstream of the electrostatic and/or magnetic lens as viewed in the direction of incidence of the charged particles, wherein the electrostatic and/or magnetic lens is arranged upstream of the starting point as viewed in the direction of incidence. ### Claim 3 (depends on 1) The analysis device as claimed in claim 1, wherein the direction of incidence is aligned parallel to the optical axis. ### Claim 4 (depends on 1) The analysis device as claimed in claim 1, wherein the analysis device has at least one of the following features: the opposing field grid device is designed in a spherical fashion; or the opposing field grid device is designed as a sphere segment. ### Claim 5 (depends on 1) The analysis device as claimed in claim 1, wherein the analysis device has one of the following features: the curvature is curved in the direction of the direction of incidence of the charged particles; or the curvature is curved in a direction opposite to the direction of incidence of the charged particles. ### Claim 6 (depends on 1) The analysis device as claimed in claim 1, wherein the analysis device has one of the following features: the opposing field grid device has at least one first grid and at least one second grid; or the opposing field grid device has at least one first grid and at least one second grid, wherein the first grid is arranged concentrically with respect to the second grid, wherein the starting point is associated both with the first grid and with the second grid. ### Claim 7 (depends on 1) The analysis device as claimed in claim 1, wherein the analysis device has one of the following features: at least one stigmator, wherein proceeding from the detector, as viewed in a direction opposite to the direction of incidence of the charged particles, firstly the electrostatic and/or magnetic lens and then the stigmator are arranged; at least one stigmator, wherein proceeding from the detector, as viewed in a direction opposite to the direction of incidence of the charged particles, firstly the electrostatic and/or magnetic lens and then the stigmator are arranged, wherein the electrostatic and/or magnetic lens has a minimum focal length, and wherein a distance between the stigmator and the electrostatic and/or magnetic lens maximally corresponds to the minimum focal length; at least one stigmator, wherein proceeding from the detector, as viewed in a direction opposite to the direction of incidence of the charged particles, firstly the stigmator and then the electrostatic and/or magnetic lens are arranged; at least one stigmator, wherein proceeding from the detector, as viewed in a direction opposite to the direction of incidence of the charged particles, firstly the stigmator and then the electrostatic and/or magnetic lens are arranged, wherein the electrostatic and/or magnetic lens has a minimum focal length, and wherein a distance between the stigmator and the electrostatic and/or magnetic lens maximally corresponds to the minimum focal length; or at least one stigmator designed with the electrostatic and/or magnetic lens as an individual optical unit. ### Claim 8 (depends on 7) The analysis device as claimed in claim 7, wherein the stigmator is of magnetic or electrostatic design. ### Claim 9 (depends on 1) The analysis device as claimed in claim 1, wherein the analysis device has a control device for controlling the excitation of the electrostatic and/or magnetic lens and wherein the control device is configured in such a way that the excitation of the electrostatic and/or magnetic lens is controlled depending on the voltage applied to the opposing field grid device. ### Claim 10 An analysis device for analyzing the energy of charged particles, comprising: at least one optical axis; at least one detector for detecting charged particles, wherein the detector has a detection area on which impinge the charged particles which move in a direction of incidence toward the detector; and at least one opposing field grid device to which a voltage is applied in such a way that a portion of the charged particles is reflected by the opposing field grid device and not detected by the detector, wherein the opposing field grid device has a curvature, and wherein the opposing field grid device is designed to be displaceable along the optical axis. ### Claim 11 (depends on 10) The analysis device as claimed in claim 10, wherein the analysis device has at least one drive unit for moving the opposing field grid device along the optical axis. ### Claim 12 (depends on 11) The analysis device as claimed in claim 11, wherein the drive unit is configured in such a way that the movement of the opposing field grid device is controlled depending on the voltage applied to the opposing field grid device. ### Claim 13 (depends on 10) The analysis device as claimed in claim 10, wherein the direction of incidence is aligned parallel to the optical axis. ### Claim 14 (depends on 10) The analysis device as claimed in claim 10, wherein the optical axis extends through the opposing field grid device and wherein the opposing field grid device has at least one center of curvature, wherein the center of curvature is an intersection point of the optical axis with the opposing field grid device, and wherein the curvature has a radius of curvature which is given by the section between the center of curvature and a starting point on the optical axis. ### Claim 15 (depends on 10) The analysis device as claimed in claim 10, wherein the analysis device has at least one of the following features: the opposing field grid device is designed in a spherical fashion; or the opposing field grid device is designed as a sphere segment. ### Claim 16 (depends on 10) The analysis device as claimed in claim 10, wherein the analysis device has one of the following features: the curvature is curved in the direction of the direction of incidence of the charged particles; or the curvature is curved in a direction opposite to the direction of incidence of the charged particles. ### Claim 17 (depends on 10) The analysis device as claimed in claim 10, wherein the analysis device has one of the following features: the opposing field grid device has at least one first grid and at least one second grid; or the opposing field grid device has at least one first grid and at least one second grid, wherein the first grid is arranged concentrically with respect to the second grid. ### Claim 18 (depends on 10) The analysis device as claimed in claim 10, wherein the analysis device has at least one stigmator, wherein proceeding from the detector, as viewed in a direction opposite to the direction of incidence of the charged particles, firstly the detector, then the opposing field grid device and then the stigmator are arranged. ### Claim 19 (depends on 18) The analysis device as claimed in claim 18, wherein the stigmator is of magnetic or electrostatic design. ### Claim 20 A particle beam apparatus for analyzing and/or processing an object, comprising: at least one beam generator for generating a particle beam comprising charged primary particles; at least one objective lens for focusing the particle beam onto the object, wherein interaction particles arise in the event of an interaction of the particle beam with the object, and at least one analysis device for analyzing the energy of charged particles in the form of the interaction particles, the analysis device having: at least one detector for detecting the charged particles, wherein the detector has a detection area on which impinge the charged particles which move in a direction of incidence toward the detector; at least one opposing field grid device to which a voltage is applied in such a way that a portion of the charged particles is reflected by the opposing field grid device and not detected by the detector; at least one electrostatic and/or magnetic lens, wherein proceeding from the detector, as viewed in a direction opposite to the direction of incidence of the charged particles, firstly the detector, then the opposing field grid device and then the electrostatic and/or magnetic lens are arranged, wherein the opposing field grid device has a curvature; at least one optical axis which extends through the opposing field grid device; a center of curvature of the opposing field grid device, wherein the center of curvature is an intersection point of the optical axis with the opposing field grid device, and wherein the curvature has a radius of curvature which is given by the section between the center of curvature and a starting point on the optical axis, wherein the opposing field grid device is curved in the direction of the starting point as viewed from the center of curvature and wherein the analysis device has one of the following features: the electrostatic and/or magnetic lens is arranged along the optical axis downstream of the starting point as viewed in the direction of incidence of the charged particles; the starting point is arranged along the optical axis between the electrostatic and/or magnetic lens and the center of curvature; or the starting point is arranged along the optical axis downstream of the electrostatic and/or magnetic lens and downstream of the center of curvature as viewed in the direction of incidence of the charged particles. ### Claim 21 (depends on 20) The particle beam apparatus as claimed in claim 20, wherein the particle beam apparatus has one of the following features: at least one beam deflection and/or beam shaping device; at least one beam deflection and/or beam shaping device comprising at least one magnetic sector for deflecting the particle beam; at least one beam deflection and/or beam shaping device and at least one control unit for controlling a beam deflection and/or beam shaping device, wherein the control unit is configured in such a way that the beam deflection and/or beam shaping device is controlled depending on the voltage applied to the opposing field grid device; or at least one beam deflection and/or beam shaping device comprising at least one magnetic sector for deflecting the particle beam and comprising at least one control unit for controlling the magnetic sector, wherein the control unit is configured in such a way that the magnetic sector is controlled depending on the voltage applied to the opposing field grid device. ### Claim 22 (depends on 20) The particle beam apparatus as claimed in claim 20, wherein the particle beam apparatus has at least one mirror corrector for correcting chromatic and/or spherical aberration. ### Claim 23 (depends on 20) The particle beam apparatus as claimed in claim 20, wherein the particle beam apparatus is designed as an electron beam apparatus and/or as an ion beam apparatus. ### Claim 24 (depends on 20) The particle beam apparatus as claimed in claim 20, wherein the beam generator for generating a particle beam comprising charged primary particles is designed as a first beam generator for generating a first particle beam comprising first charged primary particles and the objective lens is designed as a first objective lens for focusing the first particle beam, and wherein the particle beam apparatus furthermore has: at least one second beam generator for generating a second particle beam comprising second charged primary particles, and at least one second objective lens for focusing the second particle beam onto the object.