System and method for monitoring contaminations
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTzu-Sou CHUANG, Chi-Wen KUO
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Abstract
A system for monitoring contaminations includes a moisture-containing chilating gas supply adapted to provide a moisture-containing chilating gas mixing with a purge gas evacuated from a chamber, a cooling device adapted to condense a mixed gas comprising the moisture-containing chilating gas and the purge gas into a droplet, an impinger adapted to collecting the droplet on a sampling tube wall and in the mixed gas, and a conductivity meter. The droplet is dissolved in a DI water in the impinger, and the conductivity meter measures a conductivity of a fluid including the droplet and the DI water in the impinger. The fluid with contaminations has higher conductivity than that without contaminations, such that the polluted chamber can be selected.
Claims20
A wafer containing apparatus, comprising:
- a chamber adapted to contain a wafer within and comprising a vent outlet;
- a purge gas evacuation device connected to the vent outlet for evacuating a purge gas from the chamber;
- a moisture-containing chilating gas supply adapted to provide a moisture-containing chilating gas mixing with the purge gas evacuated from the chamber;
- a cooling device adapted to condense a mixed gas comprising the moisture-containing chilating gas and the purge gas into a droplet;
- and
- an impinger adapted to collect the droplet.
A system for monitoring contaminations, comprising:
- a moisture-containing chilating gas supply adapted to provide a moisture-containing chilating gas mixing with a purge gas evacuated from a chamber;
- a cooling device adapted to condense a mixed gas comprising the moisture-containing chilating gas and the purge gas into a droplet;
- an impinger connected to the cooling device, the impinger adapted to collecting the droplet, wherein the droplet is dissolved in a DI water in the impinger;
- and
- a conductivity meter adopted to measure a conductivity of a fluid comprising the droplet and the DI water in the impinger, wherein the fluid with contaminations has higher conductivity than that without contaminations.
A method for monitoring contaminations, comprising:
- mixing a moisture-containing chilating gas with a purge gas evacuated from a chamber;
- cooling a mixed gas comprising the moisture-containing chilating gas and the purge gas into a droplet;
- collecting the droplet on a sampling tube wall and in the mixed gas by an impinger;
- and
- measuring a conductivity of a fluid in the impinger in order to level the fluid.
Dependencies are inferred from the claim text.