# US 2016/0260577 A1 · Method and apparatus for inspection of scattered hot spot areas on a manufactured substrate > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2016/0260577 A1 - Document ID: US20160260577A1 - Status: Published application - Kind: A1 - Application number: 15/061,372 - Filed: 2016-03-04 - Published: 2016-09-08 - Earliest claimed: 2010-12-13 - Assignees: KLA-Tencor Corporation - Applicants: KLA-Tencor Corporation - Inventors: Sean X. Wu; Kini Vivekanand - Web page: https://patentgrep.com/patent/US20160260577A1 ## CPC - H01J 37/222: {Image processing arrangements associated with the tube} - H01J 37/06: Electron sources; Electron guns - H01J 37/265: {Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination} - H01J 37/285: Emission microscopes, e.g. field-emission microscopes - H01J 37/292: {using scanning ray} - H01J 2237/10: Lenses - H01J 2237/202: Movement - H01J 2237/2813: characterised by the application - H01J 2237/2817: Pattern inspection - H10P 74/203: {Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects} - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract One embodiment relates to a method of automated inspection of scattered hot spot areas on a manufactured substrate using an electron beam apparatus. A stage holding the substrate is moved along a swath path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate. Off-axis imaging of the hot spot areas within the moving field of view is performed. A number of hot spot areas within the moving field of view may be determined, and the speed of the stage movement may be adjusted based on the number of hot spot areas within the moving field of view. Another embodiment relates to an electron beam apparatus for inspecting scattered areas on a manufactured substrate. Other embodiments, aspects and features are also disclosed. ## Claims ### Claim 1 An electron beam apparatus comprising: an electron source for generating a primary electron beam; a lens system configured to focus the primary electron beam onto a surface of the substrate; a detector configured to detect scattered electrons from the substrate; a stage configured to hold the substrate and controllably move the substrate under the primary electron beam; and one or more controllers configured to control movement of the stage along a path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate, wherein the controller is further configured to control off-axis imaging of one or more hot spot areas within the moving field of view. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein the controller is further configured to locate the one or more hot spot areas via design data. ### Claim 3 (depends on 1) The apparatus of claim 1, wherein the controller is further configured to locate the one or more hot spot areas via one or more previous measurement results. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein the controller is further configured to locate the one or more hot spot areas via user feedback. ### Claim 5 (depends on 1) The apparatus of claim 1, wherein the controller is further configured to determine a number of hot spot areas within the moving field of view and to adjust a speed of the stage movement based on the number of hot spot areas within the moving field of view. ### Claim 6 (depends on 1) The apparatus of claim 1, wherein the system controller is further configured to determine an order for imaging the hot spots within the moving field of view and to scan the hot spot areas within the moving field of view in the determined order. ### Claim 7 (depends on 1) The apparatus of claim 1, wherein the electron beam apparatus is configured as a scanning electron microscope. ### Claim 8 (depends on 1) The apparatus of claim 1, wherein the detector is configured to detect at least one of backscattered electrons or secondary electrons. ### Claim 9 (depends on 1) The apparatus of claim 1, wherein the electron source comprises: an electron gun. ### Claim 10 An electron beam apparatus comprising: an electron source for generating a primary electron beam; a lens system configured to focus the primary electron beam onto a surface of the substrate; a detector configured to detect at least one backscattered electrons or secondary electrons from the substrate; a stage configured to hold the substrate and controllably move the substrate under the primary electron beam; and one or more controllers configured to control movement of the stage along a path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate, wherein the controller is further configured to control off-axis imaging of one or more hot spot areas within the moving field of view. ### Claim 11 (depends on 10) The apparatus of claim 10, wherein the controller is further configured to locate the one or more hot spot areas via design data. ### Claim 12 (depends on 10) The apparatus of claim 10, wherein the controller is further configured to locate the one or more hot spot areas via one or more previous measurement results. ### Claim 13 (depends on 10) The apparatus of claim 10, wherein the controller is further configured to locate the one or more hot spot areas via user feedback. ### Claim 14 (depends on 10) The apparatus of claim 10, wherein the controller is further configured to determine a number of hot spot areas within the moving field of view and to adjust a speed of the stage movement based on the number of hot spot areas within the moving field of view. ### Claim 15 (depends on 10) The apparatus of claim 10, wherein the system controller is further configured to determine an order for imaging the hot spots within the moving field of view and to scan the hot spot areas within the moving field of view in the determined order. ### Claim 16 (depends on 10) The apparatus of claim 10, wherein the electron beam apparatus is configured as a scanning electron microscope. ### Claim 17 (depends on 10) The apparatus of claim 10, wherein the electron source comprises: an electron gun. ### Claim 18 An electron beam apparatus comprising: an electron source for generating a primary electron beam; a lens system configured to focus the primary electron beam onto a surface of the substrate; a detector array configured to detect scattered electrons from the substrate; a stage configured to hold the substrate and controllably move the substrate under the primary electron beam; and one or more controllers configured to control movement of the stage along a path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate, wherein the controller is further configured to control off-axis imaging of one or more hot spot areas within the moving field of view.