# US 2016/0259245 A1 · Reagent for enhancing generation of chemical species and manufacturing apparatus

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- Number: US 2016/0259245 A1
- Document ID: US20160259245A1
- Status: Published application
- Kind: A1
- Application number: 15/027,855
- Filed: 2014-10-06
- Published: 2016-09-08
- Earliest claimed: 2013-10-07
- Assignees: Toyo Gosei Co., Ltd.
- Applicants: Toyo Gosei Co., Ltd.
- Inventors: Satoshi Enomoto; Takashi Miyazawa
- Web page: https://patentgrep.com/patent/US20160259245A1

## CPC

- G03F 7/0382: {the macromolecular compound being present in a chemically amplified negative photoresist composition}
- G03F 7/0045: {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors}
- G03F 7/0046: {with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence)}
- G03F 7/0397: {the macromolecular compound having an alicyclic moiety in a side chain}
- G03F 7/095: having more than one photosensitive layer (G03F7/075 takes precedence)
- G03F 7/2022: {Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure}
- G03F 7/203: {comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed.

## Claims

### Claim at position 1

-21. (canceled)

### Claim 22 (depends on 42)

A composition used in the method of claim 42, the composition comprising:
a first reagent capable of generating a first chemical species in at least one of the composition, a solution containing the composition, and a film formed from the composition; and
a precursor that is capable of generating a second chemical species through an interaction with the first chemical species.

### Claim 23 (depends on 22)

The composition of claim 22, wherein the first reagent is capable of generating the first chemical species through a first exposure of at least one of the composition, the solution, and the film to at least one of a first electromagnetic ray having a first wavelength and a first particle ray.

### Claim 24 (depends on 22)

The composition of claim 22, wherein the precursor is capable of generating the second chemical species through a second exposure of at least one of the composition, the solution, and the film to at least one of a second electromagnetic ray having a second wavelength and a second particle ray.

### Claim 25 (depends on 22)

The composition of claim 22, wherein:
the first chemical species is capable of generating a first product; and
the first product is capable of acting as a photosensitizer.

### Claim 26 (depends on 22)

The composition of claim 22, wherein:
the first chemical species is capable of generating a first product; and
the precursor is capable of generating the second chemical species through a third exposure of at least one of the composition, the solution, and the film by at least one of a third electromagnetic ray having a third wavelength and a third particle ray.

### Claim 27 (depends on 23)

The composition of claim 23, wherein the first electromagnetic ray and the first particle ray is an extreme ultraviolet light.

### Claim 28 (depends on 26)

The composition of claim 26, wherein:
the third exposure is carried out using the third electromagnetic ray; and
the third wavelength is longer than 250 nm.

### Claim 29 (depends on 24)

The composition of claim 24, wherein the second wavelength is longer than the third wavelength.

### Claim at position 10

-41. (canceled)

### Claim 42

A method of manufacturing a device, the method comprising: placing a composition on a member such that a film including the composition is disposed on the member;
first exposing the film to at least one of an electron beam and a first light, the wavelength of which is shorter than 50 nm;
second exposing the film to a second light, the wavelength of which is different than the first wavelength; and
third exposing the film to at least one of a third electromagnetic ray having a third wavelength and a third particle ray,
wherein
the second wavelength is longer than the third wavelength;
the third wavelength is longer than the first wavelength; and
the composition includes a first reagent able to generate a first chemical species and a precursor that generates a second chemical species.

### Claim at position 12

-44. (canceled)

### Claim 45 (depends on 42)

The method of claim 42, wherein a first period in which the first exposure is carried out does not overlap temporally a second period in which the second exposing exposure is carried out.

### Claim 46 (depends on 42)

The method of claim 42, wherein:
the first chemical species is generated by the first exposure; and
the first chemical species is a ketyl radical.

### Claim 47 (depends on 42)

The method of claim 42, wherein:
a first product is generated from the first chemical species; and
the first product is a ketone compound.

### Claim 48

(canceled)

### Claim 49 (depends on 42)

The method of claim 42, wherein the precursor generates a second chemical species by the third exposure.

### Claim 50 (depends on 42)

The method of claim 42, wherein the first product enhances the generation of the second chemical species from the precursor by absorbing the third electromagnetic ray.

### Claim 51 (depends on 42)

The method of claim 42,
wherein:
the first chemical species has a lifetime in the film; and
the first chemical species is excited within the lifetime of the first chemical species by the second exposure.

### Claim 52 (depends on 51)

The method of claim 51, wherein:
the first chemical species is generated by the first exposure; and
the exciting of the first chemical species is carried out by the second exposure.

### Claim 53 (depends on 42)

The method of claim 42, wherein the second wavelength is longer than 400 nm.

### Claim 54 (depends on 53)

The method of claim 53, wherein the third wavelength is longer than 250 nm.

### Claim 55 (depends on 42)

The method of claim 42, wherein the first reagent is an alcohol compound or an alcohol derivative with a hydroxyl group protected, as an acid generation enhancer.

### Claim 56 (depends on 22)

The composition of claim 22, wherein the first reagent is an alcohol compound or an alcohol derivative with a hydroxyl group protected, as an acid generation enhancer.

### Claim 57 (depends on 42)

The method of claim 42, wherein the first reagent is an alcohol derivative with a protected hydroxyl group.

### Claim 58 (depends on 22)

The composition of claim 22, wherein the first reagent is an alcohol derivative with a protected hydroxyl group.

### Claim 59 (depends on 23)

The composition of claim 23, wherein the first particle ray is an electron beam.