Extreme ultraviolet light generation apparatus
AssigneeGigaphoton Inc.
InventorsFumio IWAMOTO, Masaki NAKANO, Tsukasa HORI
Life of this patent
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Abstract
An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of equal to or smaller than 90 degrees with the target.
Claims12
An extreme ultraviolet light generation apparatus comprising:
- a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber;
- a target supply part configured to supply the target into the chamber;
- and
- a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of equal to or smaller than 90 degrees with the target.
An extreme ultraviolet light generation apparatus comprising:
- a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber;
- a target supply part configured to supply the target into the chamber;
- and
- a target collector including a filter configured to allow the target which is supplied by the target supply part but is not irradiated with the laser beam to pass therethrough.
Dependencies are inferred from the claim text.