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US 2016/0255707 A1Published application
Extreme ultraviolet light generation apparatus
AssigneeGigaphoton Inc.
InventorsAtsushi UEDA, Takayuki YABU, Osamu WAKABAYASHI, Georg SOUMAGNE, Takashi SAITO
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Abstract
An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.
Claims7
An extreme ultraviolet light generation apparatus comprising:
- a chamber;
- a target supply unit configured to output a target toward a predetermined region inside the chamber;
- a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region;
- and
- a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.
2 more elements
Dependencies are inferred from the claim text.