Substrate cleaning apparatus,substrate cleaning method, and substrate processing apparatus
AssigneeEbara Corporation
InventorHideaki TANAKA
Life of this patent
Estimating the term…
Abstract
A substrate cleaning apparatus for cleaning a substrate while rotating the substrate and placing a cleaning member in contact with the rotating substrate is disclosed. The substrate cleaning apparatus comprises: a self-cleaning member mounted to an arm supporting the cleaning member, the self-cleaning member being configured to come into contact with the cleaning member to perform self-cleaning of the cleaning member; and a moving mechanism mounted to the arm supporting the cleaning member, the moving mechanism being configured to move the self-cleaning member between a position where the self-cleaning member is in contact with the cleaning member and a position where the self-cleaning member is separated from the cleaning member.
Claims21
A substrate cleaning apparatus for cleaning a substrate while rotating the substrate and placing a cleaning member in contact with the rotating substrate, comprising:
- a self-cleaning member mounted to an arm supporting the cleaning member, the self-cleaning member being configured to come into contact with the cleaning member to perform self-cleaning of the cleaning member;
- and
- a moving mechanism mounted to the arm supporting the cleaning member, the moving mechanism being configured to move the self-cleaning member between a position where the self-cleaning member is in contact with the cleaning member and a position where the self-cleaning member is separated from the cleaning member.
A substrate cleaning method comprising:
- cleaning a substrate while rotating the substrate and placing a cleaning member in contact with the rotating substrate;
- and
- self-cleaning the cleaning member by bringing a self-cleaning member into contact with the cleaning member while cleaning the substrate.
A substrate cleaning apparatus comprising:
- a substrate holding mechanism configured to hold and rotate a substrate;
- a cleaning-liquid supply nozzle configured to supply a cleaning liquid onto the substrate held by the substrate holding mechanism;
- a roll cleaning tool configured to clean the substrate by rubbing the substrate in the presence of the cleaning liquid;
- and
- a suction system coupled to the roll cleaning tool and configured to suck the cleaning liquid from the substrate through the roll cleaning tool.
A substrate cleaning method comprising:
- supplying a cleaning liquid onto a substrate and rubbing a roll cleaning tool against the substrate in the presence of the cleaning liquid, while sucking the cleaning liquid from the substrate through the roll cleaning tool.
A substrate processing apparatus comprising:
- a polishing unit configured to polish a substrate;
- and
- a substrate cleaning apparatus configured to clean the substrate that has been polished by the polishing unit,
- wherein the substrate cleaning apparatus includes:
- a substrate holding mechanism configured to hold and rotate the substrate;
- a cleaning-liquid supply nozzle configured to supply a cleaning liquid onto the substrate held by the substrate holding mechanism;
- a roll cleaning tool configured to clean the substrate by rubbing the substrate in the presence of the cleaning liquid;
- and
- a suction system coupled to the roll cleaning tool and configured to suck the cleaning liquid from the substrate through the roll cleaning tool.
Dependencies are inferred from the claim text.