Substrate processing system having susceptorless substrate support with enhanced substrate heating control
AssigneeApplied Materials, Inc.
InventorsJOSEPH M. RANISH, KAILASH PATALAY
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Abstract
Methods and apparatus for processing substrates are provided herein. In some embodiments, an apparatus includes a process kit, the process kit comprising a first ring to support a substrate proximate a peripheral edge of the substrate; a second ring disposed about the first ring; and a path formed between the first and second rings that allows the first ring to rotate with respect to the second ring, wherein the path substantially prevents light from travelling between a first volume disposed below the first and second rings and a second volume disposed above the first and second rings.
Claims15
An apparatus, comprising:
- a shaft;
- a base coupled to the shaft, wherein the base comprises fused silica, alumina, sapphire, or yttria;
- and
- one or more members disposed on an outer region of the base, wherein the one or more members each comprises silicon carbon, silicon nitride, silicon carbon coated graphite, glassy carbon coated graphite, silicon nitride coated graphite, glassy carbon, graphite, silicon carbon coated silica, or glassy carbon coated silica.
An apparatus, comprising:
- a shaft;
- a base coupled to the shaft, wherein the base comprises fused silica, alumina, sapphire, or yttria;
- and
- one or more members disposed on an outer region of the base, wherein the one or more members each comprises silicon carbon, silicon nitride, silicon carbon coated graphite, glassy carbon coated graphite, silicon nitride coated graphite, glassy carbon, graphite, silicon carbon coated silica, or glassy carbon coated silica, wherein the one or more members are disposed in an upper surface of the base and extend perpendicularly away from the upper surface of the base, and wherein the one or more members are configured to support a substrate support member on an upper surface of the one or more members.
An apparatus, comprising:
- a shaft;
- a base coupled to the shaft, wherein the base comprises fused silica, alumina, sapphire, or yttria, wherein the shaft is centrally disposed relative to the base;
- and
- one or more members disposed on an outer region of the base, wherein the one or more members each comprises silicon carbon, silicon nitride, silicon carbon coated graphite, glassy carbon coated graphite, silicon nitride coated graphite, glassy carbon, graphite, silicon carbon coated silica, or glassy carbon coated silica, wherein the one or more members are disposed in an upper surface of the base and extend perpendicularly away from the upper surface of the base, wherein each of the one or more members is a solid cylinder, and wherein the one or more members are configured to support a substrate support member on an upper surface of the one or more members.
Dependencies are inferred from the claim text.