Nanostructured silicon based solar cells and methods to produce nanostructured silicon based solar cells
AssigneeDanmarks Tekniske Universitet
InventorsRasmus Schmidt Davidsen, Ole Hansen, Anja Boisen, Michael Stenbæk Schmidt
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Abstract
The present invention relates to a plasma texturing method for silicon based solar cells and the nanostructured silicon solar cells produced thereof. The silicon based solar cell comprises a silicon substrate having in at least part of its surface conical shaped nanostructures having an average height between 200 and 450 nm and a pitch between 100 and 200 nm, thereby achieving low reflectance and minimizing surface charge recombination.
Claims21
A method of producing a silicon based solar cell comprising a silicon substrate, said silicon substrate having a surface wherein at least part of said surface comprises conical shaped nanostructures having an average height between 200 and 450 nm and a pitch between 100 and 200 nm, said method comprising:
- emitter doping, metal contact deposition and producing conical shaped nanostructure having a height between 200 and 450 nm and a pitch between 100 and 200 nm on said silicon based solar cell by maskless reactive ion etching (RIE).
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