Substrate processing device and substrate processing method
AssigneeCanon Anelva Corporation
InventorYuji Kajihara
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Abstract
The invention provides a substrate processing device and a substrate processing method for cooling a substrate, which are capable of conveying a substrate in a cleaner condition. A substrate cooling device serving as a substrate processing device of an embodiment of the invention includes: a chamber; a cooling unit which performs cooling; a substrate holder which is provided with a substrate mounting surface for mounting a substrate inside the chamber, and is cooled by the cooling unit; and a shield which is provided with a side surface portion surrounding a lateral side of the substrate mounting surface inside the chamber, and is cooled by the cooling unit. Moreover, a shield heater is provided in the vicinity of a surface on the inside of the shield.
Claims11
A substrate processing device comprising:
- a chamber with inside capable of being evacuated;
- a substrate holder provided inside the chamber and including a substrate mounting surface capable of cooling a substrate;
- a shield provided inside the chamber and including a side wall portion provided to surround a lateral side of the substrate mounting surface;
- and
- shield cooling unit configured to cool the shield before the substrate is mounted on the substrate mounting surface.
Dependencies are inferred from the claim text.