Substrate processing apparatus

A substrate processing apparatus comprising:

• a substrate holding unit rotating a substrate around a vertical rotational axis passing through a central portion of the substrate while holding the substrate horizontally;
• and
• a processing liquid supplying system including an upstream heater, a supply flow passage, a plurality of upstream flow passages, a plurality of discharge ports, and a plurality of downstream heaters, and supplying a processing liquid to the substrate held by the substrate holding unit;
• and
• wherein the upstream heater heats the processing liquid to be supplied to the supply flow passage at an upstream temperature,
• the supply flow passage guides the processing liquid toward the plurality of upstream flow passages,
• the plurality of upstream flow passages branch from the supply flow passage and guide the processing liquids supplied from the supply flow passage toward the plurality of discharge ports,
• the plurality of discharge ports include a main discharge port discharging the processing liquid toward an upper surface central portion of the substrate and a plurality of auxiliary discharge ports discharging the processing liquid toward a plurality of positions within an upper surface of the substrate, the plurality of positions being away from the upper surface central portion and differing in distance from the rotational axis, and are respectively disposed at a plurality of positions differing in distance from the rotational axis, and respectively discharge the processing liquid supplied via the plurality of upstream flow passages toward the upper surface of the substrate held by the substrate holding unit,
• the plurality of upstream flow passages include a main upstream flow passage connected to the main discharge port and a plurality of auxiliary upstream flow passages connected to the plurality of auxiliary discharge ports, and
• the plurality of downstream heaters are respectively connected to the plurality of auxiliary upstream flow passages at positions further upstream than the plurality of auxiliary discharge ports, and heat the processing liquids flowing through the plurality of auxiliary upstream flow passages at a downstream temperature higher than the upstream temperature.

A substrate processing apparatus comprising:

• a substrate holding unit rotating a substrate around a vertical rotational axis passing through a central portion of the substrate while holding the substrate horizontally;
• and
• a processing liquid supplying system including an upstream heater, a supply flow passage, a plurality of upstream flow passages, a plurality of discharge ports, and a plurality of low-temperature liquid flow passages, and supplying a processing liquid to the substrate held by the substrate holding unit;
• and
• wherein the upstream heater heats a high-temperature liquid to be supplied to the supply flow passage,
• the supply flow passage guides the high-temperature liquid toward the plurality of upstream flow passages,
• the plurality of upstream flow passages include an outer upstream flow passage and a plurality of inner upstream flow passages, and branch from the supply flow passage, and guide the high-temperature liquid supplied from the supply flow passage toward the plurality of discharge ports,
• the plurality of discharge ports include an outer discharge port that is connected to the outer upstream flow passage and discharges the processing liquid toward an upper surface peripheral edge portion of the substrate and a plurality of inner discharge ports that are connected to the plurality of inner upstream flow passages and respectively discharge the processing liquid toward a plurality of positions inside the upper surface peripheral edge portion and within an upper surface of the substrate, and are respectively disposed at positions differing in distance from the rotational axis, and discharge the processing liquid supplied via the plurality of upstream flow passages toward the upper surface of the substrate, and
• the plurality of low-temperature liquid flow passages are respectively connected to the plurality of inner upstream flow passages at positions further upstream than the plurality of inner discharge ports, and guide a low-temperature liquid, that is a liquid of the same type as the high-temperature liquid flowing through the supply flow passage and lower in temperature than the high-temperature liquid, toward the plurality of inner upstream flow passages.