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US 2016/0240382 A1Published application
Method for adjusting effective work function of metal gate
AssigneeInstitute of Microelectronics, Chinese Academy of Sciences
InventorsHong YANG, Wenwu WANG, Jiang YAN, Weichun LUO
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Abstract
A method for adjusting an effective work function of a metal gate. The method includes forming a metal gate arrangement comprising at least a metal work function layer, and performing plasma treatment on at least one layer in the metal gate arrangement. In this way, it is possible to adjust the effective work function of the metal gate in a relatively flexible way.
Claims8
A method for adjusting an effective work function of a metal gate, the method comprising:
- forming a metal gate arrangement comprising at least a metal work function layer, and
- performing plasma treatment on at least one layer in the metal gate arrangement.
Dependencies are inferred from the claim text.