Substrate processing apparatus, substrate processing method, and storage medium

A substrate processing apparatus of performing a process on a substrate by supplying a processing gas onto the substrate in a vacuum atmosphere, comprising:

• a substrate mounting table installed in a vacuum vessel;
• a gas supply part configured to supply the processing gas into the vacuum vessel;
• a vacuum-exhausting part configured to exhaust the interior of the vacuum vessel;
• an elevating member configured to move up and down between an ascending position defined above a surface of the mounting table and a descending position equal to or lower than a level of the surface of the mounting table and is configured to lift up and down the substrate while holding the substrate mounted on the mounting table;
• and
• a control part configured to output a control signal to execute a first step, a second step and a third step, the first step being to supply the processing gas onto the substrate mounted on the mounting table and set an internal pressure of the vacuum vessel to a first pressure, the second step being to change the internal pressure to a second pressure lower than the first pressure, and the third step being to lift up the substrate from the mounting table by the elevating member after the first step and before the changing the internal pressure or in parallel with the changing.