Plasma ion source and charged particle beam apparatus
AssigneeHitachi High-Technologies Corporation
InventorsHiroshi OBA, Yasuhiko SUGIYAMA, Mamoru OKABE
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Abstract
A plasma ion source includes: a gas introduction chamber, into which raw gas is introduced; an insulation member provided in the gas introduction chamber; a plasma generation chamber connected to the gas introduction chamber; a coil that is wound along an outer circumference of the plasma generation chamber and to which high-frequency power is applied; and an electrode arranged at a boundary between the gas introduction chamber and the plasma generation chamber and having a plurality of through-holes formed therein, wherein a size of the through-holes is smaller than a length of a plasma sheath.
Claims7
A plasma ion source comprising:
- a gas introduction chamber, into which raw gas is introduced;
- an insulation member provided in the gas introduction chamber;
- a plasma generation chamber connected to the gas introduction chamber;
- a coil that is wound along an outer circumference of the plasma generation chamber and to which high-frequency power is applied;
- and
- an electrode arranged at a boundary between the gas introduction chamber and the plasma generation chamber and having a plurality of through-holes formed therein,
- wherein a size of the through-holes is smaller than a length of a plasma sheath.
Dependencies are inferred from the claim text.