US 2016/0238948 A1Published application

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

AssigneeNikon Corporation

InventorMichael BINNARD

Life of this patent

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Abstract

An immersion exposure apparatus and method exposes a substrate with a light beam via an optical element and immersion liquid. A table holds the substrate and is movable relative to the optical element. A pad member is movable relative to the table and is movable away from being opposite the optical element. While the table is arranged opposite the optical element, the pad member is movable relative to the table so that the pad member can be arranged adjacent to the table, and when the pad member is arranged adjacent to the table, the adjacent table and pad member are movable to locate the pad member opposite the optical element in place of the table such that the immersion liquid is maintained below the optical element during the movement.

Claims30

Dependent claims

A liquid immersion exposure apparatus that exposes a substrate with an exposure beam via an optical member and an immersion liquid, the exposure apparatus comprising:

a table arranged below the optical member and configured to hold the substrate;
and
a pad member that is movable relative to the table and having a surface that is arranged to be contactable with the immersion liquid, wherein
the table is movable relative to the optical member such that, when the table is arranged opposite to the optical member, the immersion liquid is in contact with the optical member and is maintained between the optical member and the table,
the pad member is movable relative to the optical member such that, when the pad member is arranged opposite to the optical member, the immersion liquid is in contact with the optical member and is maintained between the optical member and the pad member,
one of the table and the pad member, which is arranged away from being opposite the optical member, is movable relative to the other one of the table and the pad member, which is arranged opposite to the optical member, so that the table and the pad member are adjacent to each other and so that an upper surface of the table and the surface of the pad member are juxtaposed and are substantially coplanar,
the table and the pad member arranged adjacent to each other are movable relative to the optical member so that the one of the table and the pad member is arranged opposite to the optical member in place of the other one of the table and the pad member while the immersion liquid is substantially maintained under the optical member, and
the other one of the table and the pad member is movable at an area away from being opposite the optical member while the one of the table and the pad member is arranged opposite to the optical member to maintain the immersion liquid under the optical member.

5 more elements

A liquid immersion exposure method of exposing a substrate with an exposure beam via an optical member and an immersion liquid, the method comprising:

moving one of a table and a pad member, which is arranged away from being opposite an optical member, relative to the other one of the table and the pad member, which is arranged opposite to the optical member, so that the table and the pad member are adjacent to each other and so that an upper surface of the table and a surface of the pad member are juxtaposed and are substantially coplanar, the table being configured to hold the substrate, the pad member being movable relative to the table;
and
moving the table and the pad member, which are arranged adjacent to each other, relative to the optical member so that the one of the table and the pad member is arranged opposite to the optical member in place of the other one of the table and the pad member while the immersion liquid is maintained under the optical member,
wherein the other one of the table and the pad member is moved at an area away from being opposite the optical member while the one of the table and the pad member is arranged opposite to the optical member to maintain the immersion liquid under the optical member.

1 more element

Dependencies are inferred from the claim text.

Facts

Application: 15/138,829Filed 26 Apr 2016
Priority: 11 Apr 2003
Published: 18 Aug 2016
Term ends: Not estimatedThe source records don’t support an estimate.

Classification7 codes

G03F 7/70341
Mask projection systems: details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
G03B 27/52
Projection printing apparatus, e.g. enlarger, copying camera: details
G03F 7/70716
Handling of masks or workpieces: stages
G03F 7/70725
Stages: control

Family

Application60/462,499Us provisional application · filed 11 Apr 2003
Application11/237,721Division · filed 29 Sep 2005
Application11/822,804Division · filed 10 Jul 2007
Application13/944,487Division · filed 17 Jul 2013
Application15/138,829Division
Application11/237,721Continuation
US 2006/0023186 A1Published application
US 2007/0252965 A1Published application
US 2013/0308107 A1Published application
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US 2016/0238948 A1This patent

From the US filing history. Foreign family members aren’t listed.