Novel photoresist stripper and application process thereof

Abstract

A novel photoresist stripping liquid, used for removing superfluous photoresist on a substrate, comprises an organic solvent used for dissolving, a decrosslinking catalyst for accelerating stripping speed, and an anticorrosion agent for avoiding the substrate corrosion. The photoresist stripping liquid can shorten a stripping period, has no toxicity to human body and environment, and can thoroughly remove cross-linked photoresist after exposure, especially negative photoresist. In addition, the present invention also provides an application process of the photoresist stripping liquid. The process does not comprise heating and oscillation, thereby increasing the stripping speed and avoiding possible damage caused by auxiliary measures to the substrate.

Dependencies are inferred from the claim text.