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US 2016/0238941 A1Published application
Maskless lithography for web based processing
AssigneeApplied Materials, Inc.
InventorChristopher Dennis BENCHER
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Abstract
The present disclosure generally relates to a method and apparatus for processing a web-based substrate. As the substrate travels between rollers, the substrate may be stretched and thus distorted. Once the substrate reaches the roller, the substrate distortion is fixed. By adjusting the processing parameters, the distorted substrate is processed without correcting the distortion.
Claims15
A method of processing a web substrate, comprising:
- detecting that the substrate is distorted;
- and
- photolithographically processing the distorted substrate based upon the detected distortion.
A web-based processing apparatus, comprising:
- a roller disposed in a chamber body;
- an alignment measuring device;
- a CPU coupled with the alignment measuring device;
- a processing device coupled to the CPU;
- and
- an image shaper disposed between the processing device and the roller, wherein the image shaper is capable of creating a convex and cylindrical field shape to match a shape of the roller.
3 more elements
Dependencies are inferred from the claim text.